IP Library Granted Patent US 11,199,528
Granted Patent B2
US 11,199,528 · App. 16/524,251 · Granted Dec 14, 2021

Sensor built-in filter structure and wafer accommodation container

Inventors: Tatsuhiro Kotsugai (Tokyo, JP); Toshihiko Miyajima (Tokyo, JP); Takeshi Kagaya (Tokyo, JP)
Assignee: TDK CORPORATION
G01N33/0011G01N1/405G01N7/10G01N33/0029G01N33/0047H01L21/67389G01N2001/4016
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Quick Facts
Patent No.
US 11,199,528
App. No.
16/524,251
Granted
Dec 14, 2021
Kind
B2
Abstract

Provided is sensor built-in filter structure arranged in a wafer accommodation container, comprising: a first filter; a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas.

Claims (45)

1. A sensor built-in filter structure arranged in a wafer accommodation container, comprising:

a first filter;

a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and

a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas,

wherein the first filter and the second filter are overlapped with the gas detection sensor interposed between the first filter and the second filter.

2. The sensor built-in filter structure according to claim 1 ,

wherein the first filter removes dust contained in the gas.

3. The sensor built-in filter structure according to claim 1 ,

wherein the first filter has a particle collection rate higher than that of the second filter.

4. The sensor built-in filter structure according to claim 1 ,

wherein the second filter blocks passage of water as a liquid and allows the gas to pass.

5. The sensor built-in filter structure according to claim 1 ,

wherein the second filter has a water resistance higher than that of the first filter.

6. The sensor built-in filter structure according to claim 1 ,

wherein the state detected by the gas detection sensor is at least one of temperature, humidity, pressure and component of the gas or the dust in the gas.

7. The sensor built-in filter structure according to claim 1 , wherein the second filter has a smaller area than the first filter and is provided on a surface of the gas detection sensor on a side closer to the wafer accommodation chamber.

8. A wafer accommodation container comprising:

the sensor built-in filter structure according to claim 1 ;

the wafer accommodation chamber; and

a purge port having the flow path for introducing a cleaning gas into the wafer accommodation chamber or for discharging the gas from the wafer accommodation chamber.

9. The wafer accommodation container according to claim 8 , wherein the flow path provided with the sensor built-in filter structure is a portion of the purge port for discharging the gas from the wafer accommodation chamber.

10. A sensor built-in filter structure arranged in a wafer accommodation container, comprising:

a first filter;

a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and

a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas, wherein

the sensor built-in filter structure is in a flow path connected from an outside to the wafer accommodation chamber,

the first filter and the second filter are arranged with a predetermined interval, and

the gas detection sensor is provided on a surface of the first filter on a side closer to the wafer accommodation chamber.

11. A wafer accommodation container comprising:

the sensor built-in filter structure according to claim 10 ;

the wafer accommodation chamber; and

a purge port having the flow path for introducing a cleaning gas into the wafer accommodation chamber or for discharging the gas from the wafer accommodation chamber.

12. The wafer accommodation container according to claim 11 , wherein the flow path provided with the sensor built-in filter structure is a portion of the purge port for discharging the gas from the wafer accommodation chamber.

13. A sensor built-in filter structure arranged in a wafer accommodation container, comprising:

a first filter;

a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and

a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas, wherein

the sensor built-in filter structure is in a flow path connected from an outside to the wafer accommodation chamber,

the first filter and the second filter are arranged with a predetermined interval, and

the gas detection sensor is provided on a surface of the second filter on a side opposite to the wafer accommodation chamber.

14. A wafer accommodation container comprising:

the sensor built-in filter structure according to claim 13 ;

the wafer accommodation chamber; and

a purge port having the flow path for introducing a cleaning gas into the wafer accommodation chamber or for discharging the gas from the wafer accommodation chamber.

15. The wafer accommodation container according to claim 14 , wherein the flow path provided with the sensor built-in filter structure is a portion of the purge port for discharging the gas from the wafer accommodation chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 29, 2019
From: KOTSUGAI, TATSUHIRO; MIYAJIMA, TOSHIHIKO; KAGAYA, TAKESHI
To: TDK CORPORATION
Reel/Frame 049883/0670 →
Priority Claims (1)
JP JP2018-142848 · Jul 30, 2018 · national
Continuity (1)
Related Publication 20200033308A1 · Jan 30, 2020