IP Library Granted Patent US 11,211,226
Granted Patent B2
US 11,211,226 · App. 16/810,969 · Granted Dec 28, 2021

Pattern cross-sectional shape estimation system and program

Inventors: Toshiyuki Yokosuka (Tokyo, JP); Hirohiko Kitsuki (Tokyo, JP); Daisuke Bizen (Tokyo, JP); Makoto Suzuki (Tokyo, JP); Yusuke Abe (Tokyo, JP); Kenji Yasui (Tokyo, JP); Mayuka Osaki (Tokyo, JP); Hideyuki Kazumi (Tokyo, JP)
Assignee: HITACHI HIGH-TECH CORPORATION
H01J37/28H01J37/222H01J37/244H01J2237/2817
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Quick Facts
Patent No.
US 11,211,226
App. No.
16/810,969
Granted
Dec 28, 2021
Kind
B2
Abstract

The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.

Claims (18)

1. A pattern cross-sectional shape estimation system, comprising:

a charged particle ray device which includes a scanning deflector that scans a charged particle beam emitted from a charged particle source, a signal electron focusing lens and a signal electronic aperture that are controlled to perform discrimination of signal electrons emitted from a sample based on their angle, where the signal electron focusing lens controls a spread of signal electrons and the signal electronic aperture that restricts a detection angle of the signal electrons, and at least one detector that detects the signal electrons at different detection angles; and

an arithmetic device that generates a luminance of an image based on an output of the at least one detector, and calculates a signal waveform of a designated region on the image using the luminance,

wherein the arithmetic device generates a plurality of angle discrimination images using signal electrons at the different detection angles, and estimates a side wall shape of a measurement target pattern based on a change in a pattern dimension calculated from a signal waveform of each angle discrimination image with respect to each of the different detection angles.

2. The pattern cross-sectional shape estimation system according to claim 1 ,

wherein the arithmetic device estimates a cross-sectional shape in a depth direction of the measurement target pattern from a change in a dimensional value obtained with a different threshold value for a signal waveform of each of the angle discrimination images.

3. The pattern cross-sectional shape estimation system according to claim 1 ,

wherein the arithmetic device classifies a pattern shape based on an estimation result of the measurement target pattern, and displays information on the pattern shape and information on a taper angle of a taper portion included in the measurement target pattern on a display screen.

4. The pattern cross-sectional shape estimation system according to claim 1 ,

wherein the arithmetic device acquires, as a reference, a change in dimension with respect to a detection angle of a known pattern whose cross-sectional shape is known in advance from a storage device, and estimates a shape of the measurement target pattern from a difference between a change of the known pattern and a change in the calculated pattern dimension with respect to a detection angle.

5. A non-transitory computer readable storage medium storing thereon a program for causing a computer to execute a process of estimating a cross-sectional shape of a pattern to be measured,

wherein the process comprises the steps of:

performing discrimination of signal electrons emitted from a sample, scanned by a charged particle beam emitted from a charged particle source, based on their angle, by controlling an electron focusing lens and a signal electronic aperture, where the signal electron focusing lens controls a spread of signal electrons and the signal electronic aperture restricts a detection angle of the signal electrons;

detecting, by at least one detector, the signal electrons at different detection angles;

generating, by an arithmetic device, a luminance of an image based on an output of the at least one detector;

calculating, by the arithmetic device, a signal waveform of a designated region on the image using the luminance,

generating, by the arithmetic device, a plurality of angle discrimination images using signal electrons at the different detection angles; and

estimating, by the arithmetic device, a side wall shape of a measurement target pattern based on a change in a pattern dimension calculated from a signal waveform of each angle discrimination image with respect to each of the different detection angles.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 6, 2020
From: YOKOSUKA, TOSHIYUKI; KITSUKI, HIROHIKO; BIZEN, DAISUKE; SUZUKI, MAKOTO; ABE, YUSUKE; YASUI, KENJI; OSAKI, MAYUKA; KAZUMI, HIDEYUKI
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052035/0091 →
Priority Claims (1)
JP JP2019-073517 · Apr 8, 2019 · national
Continuity (1)
Related Publication 20200321189A1 · Oct 8, 2020
Cited By (1)
US 12,500,061