Systems and methods of modulating flow during vapor jet deposition of organic materials
Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.
1. A system comprising:
a substrate holder configured for affixing a substrate thereto, the substrate holder configured to support an affixed substrate;
a nozzle positioned above the substrate holder and within not more than 1000 μm of a top surface of the affixed substrate;
a source of material to be deposited on the affixed substrate in fluid communication with the nozzle;
a delivery gas source in fluid communication with the source of material to be deposited with the nozzle;
an exhaust channel disposed adjacent to the nozzle to remove at least a portion of surplus material;
a confinement gas source that is separate from the delivery gas source and in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to and operable concurrently with both the exhaust channel and the delivery gas source;
an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target on the top surface of the affixed substrate;
an actuator configured to adjust a fly height separation between at least one deposition nozzle aperture of the nozzle and a deposition target on the top surface of the affixed substrate;
a displacement sensor configured to measure the fly height separation between the at least one deposition nozzle aperture and the deposition target in a plane parallel to the at least one deposition nozzle aperture over the deposition target and
a controller in communication with the actuator and the displacement sensor, the controller configured to control the actuator to adjusted the fly height separation between the at least deposition nozzle aperture and the deposition target to start or stop the deposition of the material on the deposition target from the at least one deposition nozzle aperture.
2. The system of claim 1 , further comprising a nozzle block having a plurality of nozzles.
3. The system of claim 1 , wherein the adjustment of the fly height is such that the delivery gas flow is less than or equal to an exhaust flow from the exhaust channel.
4. The system of claim 1 , wherein the nozzle in fluid communication with the source deposits a feature with the material, and
wherein the material is organic light emitting diode (OLED) material.
5. The system of claim 4 , wherein the nozzle is controlled to deposit the feature according to at least one of the group selected from: a chamber pressure, an exhaust pressure, an exhaust flow, a delivery flow, and fly height.
6. The system of claim 4 , wherein the deposited feature is selected from the group consisting of: lines, pixels, and patterns.
7. The system of claim 4 , wherein the feature is less than or equal to 1000 μm.
8. The system of claim 4 , wherein the feature is less than 50 μm full width at half maximum (FWHM).