Semiconductor device and method of fabricating the same
A semiconductor device includes a channel pattern including first and second semiconductor patterns stacked on a substrate, a gate electrode covering top and lateral surfaces of the channel pattern and extending in a first direction, and including a first gate segment between the first semiconductor pattern and the second semiconductor pattern, a gate spacer covering a lateral surface of the gate electrode and including an opening exposing the channel pattern, and a first source/drain pattern on a side of the gate spacer and in contact with the channel pattern through the opening, the first source/drain pattern including a sidewall center thickness at a height of the first gate segment and at a center of the opening, and a sidewall edge thickness at the height of the first gate segment and at an edge of the opening, the sidewall edge thickness being about 0.7 to 1 times the sidewall center thickness.
1. A semiconductor device, comprising:
a channel pattern that includes a first semiconductor pattern and a second semiconductor pattern that are sequentially stacked on a substrate;
a gate electrode that covers a top surface and a lateral surface of the channel pattern and extends in a first direction, the gate electrode including a first gate segment between the first semiconductor pattern and the second semiconductor pattern;
a gate spacer that covers a lateral surface of the gate electrode and includes an opening through which the channel pattern is exposed; and
a first source/drain pattern that is on a side of the gate spacer and is in contact with the channel pattern through the opening, the first source/drain pattern including:
a sidewall center thickness at a height of the first gate segment and at a center of the opening; and
a sidewall edge thickness at the height of the first gate segment and at an edge of the opening,
wherein the sidewall edge thickness is about 0.7 to 1 times the sidewall center thickness.
2. The semiconductor device as claimed in claim 1 , further comprising an active pattern that protrudes from the substrate and is below the channel pattern and the first source/drain pattern, wherein:
the first source/drain pattern extends to contact the active pattern,
the first source/drain pattern has a bottom thickness at a position where the first source/drain pattern contacts the active pattern, and
the bottom thickness is greater than the sidewall center thickness.
3. The semiconductor device as claimed in claim 1 , wherein the sidewall center thickness increases with decreasing distance from the substrate.
4. The semiconductor device as claimed in claim 1 , further comprising a second source/drain pattern that is on the first source/drain pattern and is spaced apart from the channel pattern,
wherein a portion of the second source/drain pattern is inserted into the opening.
5. The semiconductor device as claimed in claim 4 , wherein the first source/drain pattern and the second source/drain pattern each include germanium, a germanium content of the first source/drain pattern being less than a germanium content of the second source/drain pattern.
6. The semiconductor device as claimed in claim 4 , further comprising at least one subsidiary source/drain pattern between the first source/drain pattern and the second source/drain pattern, wherein:
the first source/drain pattern, the second source/drain pattern, and the subsidiary source/drain pattern include germanium, a germanium content of the subsidiary source/drain pattern being greater than a germanium content of the first source/drain pattern and less than a germanium content of the second source/drain pattern.
7. The semiconductor device as claimed in claim 4 , wherein the gate spacer includes:
a first spacer sidewall outside the opening; and
a second spacer sidewall that corresponds to an inner sidewall of the opening,
wherein the second source/drain pattern contacts the first and second spacer sidewalls.
8. The semiconductor device as claimed in claim 1 , wherein the sidewall edge thickness ranges from 3 nm to 7 nm.
9. The semiconductor device as claimed in claim 1 , further comprising a gate dielectric layer interposed between the gate electrode and the gate spacer and exposed by the opening, wherein:
the first source/drain pattern has an outer sidewall spaced apart from the gate dielectric layer,
the gate spacer includes a first sidewall spacer and a second sidewall spacer that are exposed to the opening and that face each other,
the outer sidewall of the first source/drain pattern meets the first sidewall spacer at a first position at the height of the first gate segment,
the outer sidewall of the first source/drain pattern meets the second sidewall spacer at a second position at the height of the first gate segment, and
a first angle between a first tangent line, which is tangent to the outer sidewall of the first source/drain pattern and passes through the first position, and a second tangent line, which is tangent to the outer sidewall of the first source/drain pattern and passes through the second position, ranges from 150° to 180° .
10. A semiconductor device, comprising:
an active pattern that protrudes from a substrate;
a channel pattern that includes a first semiconductor pattern and a second semiconductor pattern that are sequentially stacked on the active pattern;
a gate electrode that covers a top surface and a lateral surface of the channel pattern and extends in a first direction, the gate electrode including a first gate segment between the first semiconductor pattern and the second semiconductor pattern;
a gate spacer that covers a lateral surface of the gate electrode and includes an opening through which a portion of the channel pattern is exposed; and
a first source/drain pattern on a side of the gate spacer, the first source/drain pattern contacting the portion of the channel pattern through the opening and simultaneously contacting the active pattern, the first source/drain pattern including:
a first thickness contacting the portion of the channel pattern through the opening at a side of the opening; and
a second thickness contacting the portion of the channel pattern through the opening in a central region of the opening,
wherein the second thickness is greater than the first thickness.
11. The semiconductor device as claimed in claim 10 , wherein a sidewall of the first gate segment has a recessed profile.
12. The semiconductor device as claimed in claim 10 , further comprising a second source/drain pattern that is on the first source/drain pattern and is spaced apart from the channel pattern,
wherein a portion of the second source/drain pattern is inserted into the opening.
13. The semiconductor device as claimed in claim 12 , wherein the gate spacer includes:
a first spacer sidewall outside the opening; and
a second spacer sidewall that corresponds to an inner sidewall of the opening,
wherein the second source/drain pattern contacts the first and second spacer sidewalls.
14. The semiconductor device as claimed in claim 10 , wherein
the second thickness is about 0.7 to 1 times the first thickness.
15. A semiconductor device, comprising:
a channel pattern that includes a first semiconductor pattern and a second semiconductor pattern that are sequentially stacked on a substrate;
a gate electrode that covers a top surface and a lateral surface of the channel pattern and extends in a first direction, the gate electrode including a first gate segment between the first semiconductor pattern and the second semiconductor pattern;
a gate spacer that covers a lateral surface of the gate electrode and includes an opening through which the channel pattern is exposed;
a gate dielectric layer interposed between the first gate segment and the gate spacer and exposed through the opening;
a first source/drain pattern contacting the channel pattern in the opening;
a second source/drain pattern on the first source/drain pattern and having a portion that is in contact with a lateral surface of the gate spacer and is spaced apart from the channel pattern, and has another portion that is inserted into the opening, wherein:
the second source/drain pattern is spaced apart from a sidewall of a gate dielectric layer by a first distance at a height of the first gate segment and at a center of the opening,
the second source/drain pattern is spaced apart from the sidewall of the gate dielectric layer by a second distance at the height of the first gate segment and at an edge of the opening, and
the second distance is about 0.7 to 1 times the first distance.
16. The semiconductor device as claimed in claim 15 , wherein a thickness of the first source/drain pattern increases toward the substrate.
17. The semiconductor device as claimed in claim 16 , wherein the first source/drain pattern and the second source/drain pattern include germanium, a germanium content of the first source/drain pattern being less than a germanium content of the second source/drain pattern.
18. The semiconductor device as claimed in claim 16 , further comprising at least one subsidiary source/drain pattern between the first source/drain pattern and the second source/drain pattern, wherein:
the first source/drain pattern, the second source/drain pattern, and the subsidiary source/drain pattern include germanium, a germanium content of the subsidiary source/drain pattern being greater than a germanium content of the first source/drain pattern and less than a germanium content of the second source/drain pattern.
19. The semiconductor device as claimed in claim 15 ,
wherein the gate spacer includes:
a first spacer sidewall outside the opening; and
a second spacer sidewall that corresponds to an inner sidewall of the opening,
and wherein the second source/drain pattern contacts the first and second spacer sidewalls.