Pixel device and display using a monolithic blue/green LED combined with red luminescence materials
View Patent ↗An LED has: a substrate formed as a substrate layer; a buffer layer formed on the substrate layer; and an N− doped layer formed on the buffer layer. A first dual color blue/green MQW active region, a negative electrode, and a second dual color blue/green MQW active region formed on the N− doped layer. A first P− doped layer is formed on the first dual color blue green MQW active region. A second P− doped layer is formed on the second dual color blue green MQW active region. A first P+ doped layer is formed on the first P− doped layer. A second P+ doped layer is formed on the second P− doped layer. A first positive electrode is formed on the first P+ doped layer. A second positive electrode is formed on the second P+ doped layer. A blue/green LED with red luminescence materials emits a full spectrum.
1. A light-emitting diode (LED), comprising:
a. a substrate, wherein the substrate is formed as a substrate layer;
b. a buffer layer, wherein the buffer layer is formed on the substrate layer;
c. an N− doped layer, wherein the N− doped layer is formed on the buffer layer;
d. a first dual color blue green MQW active region formed on the N− doped layer;
e. a second dual color blue green MQW active region formed on the N− doped layer;
f. a negative electrode, wherein the negative electrode is formed on the N− doped layer;
g. a first P− doped layer, wherein the first P− doped layer is formed on the first dual color blue green MQW active region;
h. a second P− doped layer, wherein the second P− doped layer is formed on the second dual color blue green MQW active region;
i. a first P+ doped layer, wherein the first P+ doped layer is formed on the first P− doped layer;
j. a second P+ doped layer, wherein the second P+ doped layer is formed on the second P− doped layer;
k. a first positive electrode, wherein the first positive electrode is formed on the first P+ doped layer;
l. a second positive electrode, wherein the second positive electrode is formed on the second P+ doped layer; and
m. a red luminescence layer, wherein the red luminescence layer is mounted over the second P+ doped layer.
2. The light-emitting diode (LED), of claim 1 , wherein the first dual color blue/green MQW active region is configured to output a blue emission having a peak wavelength between 450 nm and 475 nm when the first positive electrode has a current flow of ˜360 mA.
3. The light-emitting diode (LED), of claim 1 , wherein the first dual color blue green MQW active region is configured to output a green emission having a peak wavelength between 500 nm and 550 nm when the first positive electrode has a current flow of 40 mA.
4. The light-emitting diode (LED), of claim 1 , wherein the first dual color blue/green MQW active region is formed of a laminated structure comprising a P-AlGaN electron blocking layer formed over a green emission layer, wherein the green emission layer is formed over a GaN barrier layer, wherein the GaN barrier layer is formed over a blue emission layer, wherein the blue emission layer is formed over an InGaN compliance layer.
5. The light-emitting diode (LED), of claim 4 , wherein the green emission layers comprise multiple quantum well (MQW) structures with In 0.25 Ga 0.75 N (3 nm)/GaN (9 nm) structures, wherein the green emission layer has green emission sublayers.
6. The light-emitting diode (LED), of claim 4 , wherein the blue emission layers comprise multiple quantum well (MQW) structures with In 0.15 Ga 0.85 N (3 nm)/GaN (9 nm) structures, wherein the blue emission layer has blue emission sublayers.
7. The light-emitting diode (LED), of claim 5 , wherein the light-emitting diode is configured to independently and selectively emit three primary colors and their mixtures within one single chip, and wherein the chip size ranges from as small as one micrometer square to as large as 100 millimeter square.
8. The light-emitting diode (LED), of claim 6 , wherein the green emission layers comprise multiple quantum well (MQW) structures with In 0.25 Ga 0.75 N (3 nm)/GaN (9 nm) structures, wherein the green emission layer has green emission sublayers.
9. The light-emitting diode (LED), of claim 8 , wherein the blue emission layers comprise multiple quantum well (MQW) structures with In 0.15 Ga 0.85 N (3 nm)/GaN (9 nm) structures, wherein the blue emission layer has blue emission sublayers.
10. A light-emitting diode (LED); comprising:
a. a substrate, wherein the substrate is formed as a substrate layer;
b. a buffer layer, wherein the buffer layer is formed on the substrate layer;
c. an N− doped layer, wherein the N− doped layer is formed on the buffer layer;
d. a first dual color blue green MQW active region formed on the N− doped layer;
e. a second MQW active region formed on the N− doped layer;
f. a negative electrode, wherein the negative electrode is formed on the N− doped layer;
g. a first P− doped layer, wherein the first P− doped layer is formed on the first dual color blue green MQW active region;
h. a second P− doped layer, wherein the second P− doped layer is formed on the second MQW active region;
i. a first P+ doped layer, wherein the first P+ doped layer is formed on the first P+ doped layer;
j. a second P+ doped layer, wherein the second P+ doped layer is formed on the second P− doped layer;
k. a first positive electrode, wherein the first positive electrode is formed on the first P+ doped layer;
l. a second positive electrode, wherein the second positive electrode is formed on the second P+ doped layer; and
m. a red luminescence layer, wherein the red luminescence layer is mounted over the second P+ doped layer.
11. The light-emitting diode (LED), of claim 10 , wherein the first dual color blue/green MQW active region is configured to output a blue emission having a peak wavelength between 450 nm and 475 nm when the first positive electrode has a current flow of ˜360 mA.
12. The light-emitting diode (LED), of claim 10 , wherein the first dual color blue green MQW active region is configured to output a green emission having a peak wavelength between 500 nm and 550 nm when the first positive electrode has a current flow of 40 mA.
13. The light-emitting diode (LED), of claim 10 , wherein the first dual color blue/green MQW active region is formed of a laminated structure comprising a P-AlGaN electron blocking layer formed over a green emission layer, wherein the green emission layer is formed over a GaN barrier layer, wherein the GaN barrier layer is formed over a blue emission layer, wherein the blue emission layer is formed over an InGaN compliance layer 47 .
14. The light-emitting diode (LED), of claim 13 , wherein the green emission layers comprise multiple quantum well (MQW) structures with In 0.25 Ga 0.75 N (3 nm)/GaN (9 nm) structures, wherein the green emission layer has green emission sublayers.
15. The light-emitting diode (LED), of claim 13 , wherein the blue emission layers comprise multiple quantum well (MQW) structures with In 0.15 Ga 0.85 N (3 nm)/GaN (9 nm) structures, wherein the blue emission layer has blue emission sublayers.
16. The light-emitting diode (LED), of claim 13 , wherein the light-emitting diode is configured to independently and selectively emit three primary colors and their mixtures within one single chip, and wherein the chip size ranges from as small as one micrometer square to as large as 100 millimeter square.
17. The light-emitting diode (LED), of claim 16 , wherein the green emission layers comprise multiple quantum well (MQW) structures with In 0.25 Ga 0.75 N (3 nm)/GaN (9 nm) structures, wherein the green emission layer has green emission sublayers.
18. The light-emitting diode (LED), of claim 16 , wherein the blue emission layers comprise multiple quantum well (MQW) structures with In 0.15 Ga 0.85 N (3 nm)/GaN (9 nm) structures, wherein the blue emission layer has blue emission sublayers.