Solid-state imaging device with uneven structures and method for manufacturing the same, and electronic apparatus
The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.
1. A light detecting device, comprising:
a semiconductor substrate including a photoelectric conversion region;
a first inter-pixel separation trench disposed in the semiconductor substrate in a cross-sectional view;
a second inter-pixel separation trench disposed adjacent to the first inter-pixel separation trench in the cross-sectional view;
a recessed portion disposed in the semiconductor substrate in the cross-sectional view; and
a film including one of hafnium oxide, tantalum oxide, or zirconium oxide, the film being disposed in the first inter-pixel separation trench, the second inter-pixel separation trench, and the recessed portion,
wherein the photoelectric conversion region is disposed between the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view,
wherein the recessed portion is disposed between the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view, and
wherein a depth of the recessed portion is shallower than a depth of the first inter-pixel separation trench and a depth of the second inter-pixel separation trench in the cross-sectional view.
2. The light detecting device of claim 1 , wherein a light-receiving surface of the semiconductor substrate includes:
a first flat portion disposed between the first inter-pixel separation trench and the recessed portion in the cross-sectional view; and
a second flat portion disposed between the second inter-pixel separation trench and the recessed portion in the cross-sectional view.
3. The light detecting device of claim 2 , wherein the film is disposed above the first flat portion and the second flat portion in the cross-sectional view.
4. The light detecting device of claim 1 , wherein at least a part of the film is fully embedded in the recessed portion in the cross-sectional view.
5. The light detecting device of claim 1 , wherein the recessed portion is a spindle-shape in the cross-sectional view.
6. The light detecting device of claim 1 , wherein a light-receiving surface of the semiconductor substrate includes another recessed portion adjacent to the recessed portion, wherein the another recessed portion is disposed between the recessed portion and the first inter-pixel separation trench.
7. The light detecting device of claim 1 , wherein widths of the first inter-pixel separation trench and the second inter-pixel separation trench are smaller than the depths of the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view.
8. The light detecting device of claim 1 , wherein the semiconductor substrate includes a first material, and
wherein the first inter-pixel separation trench and the second inter-pixel separation trench each include at least one second material different from the first material.
9. The light detecting device of claim 8 , wherein a refractive index of the second material is smaller than a refractive index of the first material.
10. The light detecting device of claim 1 , further comprising:
a first light shielding film disposed above the first inter-pixel separation trench in the cross-sectional view; and
a second light shielding film disposed above the second inter-pixel separation trench in the cross-sectional view.
11. The light detecting device of claim 10 , wherein each of the first light shielding film and the second light shielding includes at least one of tungsten, aluminum, or copper.
12. The light detecting device of claim 1 , further comprising:
an insulating film disposed in the first inter-pixel separation trench and the second inter-pixel separation trench, wherein the insulating film disposed on the film.
13. The light detecting device of claim 1 , further comprising:
a wiring layer disposed on a surface opposite to a light receiving surface of the semiconductor substrate.
14. The light detecting device of claim 12 , wherein a refractive index of the insulating film is smaller than a refractive index of the semiconductor substrate.
15. The light detecting device of claim 12 , wherein the insulating film is disposed above the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view.
16. The light detecting device of claim 12 , wherein the insulating film includes one of silicon oxide, silicon nitride, or silicon oxynitride.
17. An electronic device, comprising:
a semiconductor substrate including a photoelectric conversion region;
a first inter-pixel separation trench disposed in the semiconductor substrate in a cross-sectional view,
a second inter-pixel separation trench disposed adjacent to the first inter-pixel separation trench in the cross-sectional view;
a recessed portion disposed in the semiconductor substrate in the cross-sectional view; and
a film including one of hafnium oxide, tantalum oxide, or zirconium oxide, the film being disposed in the first inter-pixel separation trench, the second inter-pixel separation trench, and the recessed portion,
wherein the photoelectric conversion region is disposed between the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view,
wherein the recessed portion is disposed between the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view, and
wherein a depth of the recessed portion is shallower than a depth of the first inter-pixel separation trench and a depth of the second inter-pixel separation trench in the cross-sectional view.
18. The electronic device of claim 17 , wherein a light-receiving surface of the semiconductor substrate includes:
a first flat portion disposed between the first inter-pixel separation trench and the recessed portion in the cross-sectional view; and
a second flat portion disposed between the second inter-pixel separation trench and the recessed portion in the cross-sectional view, wherein the film is disposed above the first flat portion and the second flat portion.
19. A method of manufacturing a light detecting device comprising:
forming a photoelectric conversion region in a semiconductor substrate;
forming a first inter-pixel separation trench, a second inter-pixel separation trench, and a recessed portion in the semiconductor substrate, wherein the second inter-pixel separation trench is adjacent to the first inter-pixel separation trench in a cross-section view; and
forming a film in the first inter-pixel separation trench, the second inter-pixel separation trench, and the recessed portion, the film including one of hafnium oxide, tantalum oxide, or zirconium oxide,
wherein the photoelectric conversion region is disposed between the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view,
wherein the recessed portion is disposed between the first inter-pixel separation trench and the second inter-pixel separation trench in the cross-sectional view, and
wherein a depth of the recessed portion is shallower than a depth of the first inter-pixel trench and a depth of the second inter-pixel separation trench.