IP Library › Granted Patent US 1,131,782
Granted Patent S1
US 1,131,782 · App. 29/940,510 · Granted Jun 23, 2026

Mask

Inventor: Ligui He (New York, NY)
Assignee: DCSTAR INC
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Quick Facts
Patent No.
US 1,131,782
App. No.
29/940,510
Granted
Jun 23, 2026
Kind
S1
Claims (1)

The ornamental design for a mask, as shown and described.

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