IP Library › Granted Patent US 1,131,783
Granted Patent S1
US 1,131,783 · App. 29/940,515 · Granted Jun 23, 2026

Mask

Inventor: David Luo (New York, NY)
Assignee: DCSTAR INC
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 1,131,783
App. No.
29/940,515
Granted
Jun 23, 2026
Kind
S1
Claims (1)

The ornamental design for a mask, as shown and described.

References Cited (22)
US D556898S · Guney · 2007 [cited by examiner]
US D556901S · Davidson · 2007 [cited by examiner]
US 7640933B1 · Ho · 2010 [cited by examiner]
US D761415S · Walker · 2016 [cited by examiner]
US 10926050B2 · Eves · 2021 [cited by examiner]
US 11471633B2 · Baba · 2022 [cited by examiner]
US D994876S · Bornholdt · 2023 [cited by examiner]
US D1003431S · Rothermel · 2023 [cited by examiner]
US D1007669S · Li · 2023 [cited by examiner]
US D1019936S · He · 2024 [cited by examiner]
US D1034959S · He · 2024 [cited by examiner]
US D1036157S · He · 2024 [cited by examiner]
US 12274829B1 · Luo · 2025 [cited by examiner]
US D1084298S · He · 2025 [cited by examiner]
US D1084299S · Luo · 2025 [cited by examiner]
US 20020005198A1 · Kwok · 2002 [cited by examiner]
US 20070125384A1 · Zollinger · 2007 [cited by examiner]
US 20140144448A1 · Eifler · 2014 [cited by examiner]
US 20210038848A1 · Eves · 2021 [cited by examiner]
US 20240382711A1 · Wang · 2024 [cited by examiner]
US 20240390626A1 · Luo · 2024 [cited by examiner]
EM 150754730010 · 2024 [cited by examiner]