DNA nanostructure patterned templates
View Patent ↗A method of forming a patterned device includes depositing at least one nanostructure comprising self-assembled nucleic acids formed into a predetermined conformation upon a surface of a substrate, depositing a stabilizing layer of material mechanically stronger than the at least one nanostructure over the at least one nanostructure and the surface of the substrate to form a positive pattern template, depositing a layer of a first polymer over the positive pattern template, and removing the layer of the first polymer from connection with the positive pattern template, wherein the layer of the first polymer includes a surface having a negative imprint of the positive pattern template.
1. A method of forming a patterned device, comprising:
depositing at least one nanostructure comprising self-assembled nucleic acids formed into a predetermined conformation upon a surface of a substrate,
depositing a stabilizing layer having a thickness in the range of 2 nm to 15 nm of material mechanically stronger than the at least one nanostructure and selected from the group of a metal, a metal oxide or a nonmetallic, inorganic oxide over the at least one nanostructure and a remainder of the surface of the substrate to form a positive pattern template,
depositing a layer of a first polymer over the positive pattern template, and
removing the layer of the first polymer from connection with the positive pattern template, wherein the layer of the first polymer includes a surface having a negative imprint of the positive pattern template.
2. The method of claim 1 further comprising, after removal of the layer of the first polymer, depositing a layer of a second polymer over the surface of the layer of the first polymer having the negative imprint to create a positive copy of the negative imprint upon a surface of the layer of the second polymer.
3. The method of claim 1 wherein the stabilizing layer is deposited via a thin film technique.
4. The method of claim 1 wherein the stabilizing layer is deposited via atomic layer deposition, vacuum deposition, sputtering, chemical vapor deposition or laser assisted deposition.
5. The method of claim 1 wherein the stabilizing layer comprises a metal oxide or a nonmetallic, inorganic oxide.
6. The method of claim 1 wherein the stabilizing layer comprises aluminum oxide or silicon oxide.
7. The method of claim 1 wherein the stabilizing layer comprises aluminum oxide.
8. The method of claim 5 wherein the stabilizing layer has a thickness in the range of 3 nm to 15 nm.
9. The method of claim 5 wherein the stabilizing layer has a thickness in the range of 3 nm to 10 nm.
10. The method of claim 1 further comprising depositing a layer of a third polymer over the layer of the first polymer before removing the layer of the first polymer from connection with the positive pattern template.
11. The method of claim 1 wherein the nucleic acids comprise DNA.
12. The method of claim 1 wherein the layer of the first polymer is deposited upon the positive pattern template in solution.
13. The method of claim 1 wherein the layer of the first polymer is deposited upon the positive pattern template via spin casting.
14. The method of claim 1 wherein the at least one nanostructure has at least one dimension of no greater than 80 nm.
15. The method of claim 14 wherein the at least one nanostructure has at least one dimension in the range of 1 nm to 80 nm.
16. The method of claim 1 wherein the stabilizing layer has a thickness in the range of 3 nm to 15 nm.
17. The method of claim 16 wherein the at least one nanostructure has at least one dimension in the range of 1 nm to 80 nm.
18. The method of claim 16 further comprising, after removal of the layer of the first polymer which is hydrophilic, depositing a layer of a second polymer over the surface of the layer of the first polymer having the negative imprint to create a positive copy of the negative imprint upon a surface of the layer of the second polymer.
19. The method of claim 16 wherein the nucleic acids comprise DNA.
20. The method of claim 1 wherein the first polymer is a hydrophobic polymer and water is added to at least one edge of an assembly layer of the first polymer deposited over the positive pattern template before removing the layer of the first polymer from connection with the positive pattern template.