Dual-port SRAM structure
View Patent ↗The static random access memory (SRAM) cell of the present disclosure includes a first pull-down device, a second pull-down device, a first pass-gate device, and a second pass-gate device in a first p-well on a substrate; a third pull-down device, a fourth pull-down device, a third pass-gate device, and a fourth pass-gate device in a second p-well on the substrate; a first pull-up device and a second pull-up device in an n-well between the first p-well and the second p-well; and a first landing pad between the second pull-down device and the first pull-up device. The first landing pad is electrically coupled to a gate structure of the second pass-gate device by way of a first gate via.
1. A static random access memory (SRAM) cell comprising:
a first pull-down device (PD-1), a second pull-down device (PD-2), a first pass-gate device (PG-1), and a second pass-gate device (PG-2) disposed in a first p-well on a substrate, wherein active regions of the second pass-gate device (PG-2) and the second pull-down device (PD-2) are aligned along a first direction;
a third pull-down device (PD-3), a fourth pull-down device (PD-4), a third pass-gate device (PG-3), and a fourth pass-gate device (PG-4) disposed in a second p-well on the substrate, wherein active regions of the third pass-gate device (PG-3) and the third pull-down device (PD-3) are aligned along the first direction;
a first pull-up device (PU-1) and a second pull-up device (PU-2) disposed in an n-well disposed between the first p-well and the second p-well, where an active region of the first pull-up device (PU-1) extends along the first direction; and
a first landing pad disposed between the second pull-down device (PD-2) and the first pull-up device (PU-1), wherein the first landing pad is electrically coupled to a gate structure of the second pass-gate device (PG-2) by way of a first gate via.
2. The SRAM cell of claim 1 , wherein the first gate via is disposed between the second pull-down device (PD-2) and the first pull-up device (PU-1).
3. The SRAM cell of claim 1 , further comprising:
a second landing pad disposed between the third pull-down device (PD-3) and the second pull-up device (PU-2), wherein the second landing pad is electrically coupled to a gate structure of a third pass-gate device (PG-3) by way of a second gate via.
4. The SRAM cell of claim 3 , wherein the second gate via is disposed between the third pull-down device (PD-3) and the second pull-up device (PU-2).
5. The SRAM cell of claim 1 , wherein a drain of the first pull-down device (PD-1), a drain of the second pull-down device (PD-2), and a drain the first pull-up device (PU-1) are electrically coupled to a first long contact.
6. The SRAM cell of claim 1 , wherein a drain of the third pull-down device (PD-3), a drain of the fourth pull-down device (PD-4), and a drain the second pull-up device (PU-2) are electrically coupled to a first long contact.
7. The SRAM cell of claim 1 , wherein a source of the first pull-down device (PD-1) and a source of the second pull-down device (PD-2) are electrically coupled to a third long contact.
8. The SRAM cell of claim 1 , wherein a source of the third pull-down device (PD-3) and a source of the fourth pull-down device (PD-4) are electrically coupled to a third long contact.
9. A static random access memory (SRAM) cell comprising:
a first pull-down device (PD-1), a second pull-down device (PD-2), a first pass-gate device (PG-1), and a second pass-gate device (PG-2) disposed in a first p-well on a substrate;
a third pull-down device (PD-3), a fourth pull-down device (PD-4), a third pass-gate device (PG-3), and a fourth pass-gate device (PG-4) disposed in a second p-well on the substrate; and
a first pull-up device (PU-1) and a second pull-up device (PU-2) disposed in an n-well disposed between the first p-well and the second p-well,
wherein the first pull-down device (PD-1), the second pull-down device (PD-2), and the first pull-up device (PU-1) share a gate structure extending along a first direction,
wherein a drain of the first pull-down device (PD-1), a drain of the second pull-down device (PD-2), and a drain the first pull-up device (PU-1) are electrically coupled to a first long contact.
10. The SRAM cell of claim 9 , further comprising:
a first landing pad disposed between the second pull-down device (PD-2) and the first pull-up device (PU-1), wherein the first landing pad is electrically coupled to a gate structure of the second pass-gate device (PG-2) by way of a first gate via.
11. The SRAM cell of claim 10 , wherein the first gate via is disposed adjacent to the first long contact.
12. The SRAM cell of claim 9 , wherein a drain of the third pull-down device (PD-3), a drain of the fourth pull-down device (PD-4), and a drain the second pull-up device (PU-2) are electrically coupled to a second long contact.
13. The SRAM cell of claim 12 , further comprising:
a second landing pad disposed between the third pull-down device (PD-3) and the second pull-up device (PU-2), wherein the second landing pad is electrically coupled to a gate structure of the third pass-gate device (PG-3) by way of a second gate via.
14. The SRAM cell of claim 13 , wherein the second gate via is disposed adjacent to the second long contact.
15. A static random access memory (SRAM) cell comprising:
a first pull-down device (PD-1), a second pull-down device (PD-2), a first pass-gate device (PG-1), and a second pass-gate device (PG-2) disposed in a first p-well on a substrate, wherein the first pass-gate device (PG-1) and the first pull-down device (PD-1) share a first active region extending along a first direction, wherein the second pass-gate device (PG-2) and the second pull-down device (PD-2) share a second active region extending along the first direction;
a third pull-down device (PD-3), a fourth pull-down device (PD-4), a third pass-gate device (PG-3), and a fourth pass-gate device (PG-4) disposed in a second p-well on the substrate; and
a first pull-up device (PU-1) and a second pull-up device (PU-2) disposed in an n-well disposed between the first p-well and the second p-well, where a third active region of the first pull-up device (PU-1) extends along the first direction,
wherein the first active region and the second active region are spaced apart by a first spacing,
wherein the second active region and the third active region are spaced apart by a second spacing greater than the first spacing.
16. The SRAM cell of claim 15 , wherein a ratio of the second spacing to the first spacing is between 1.05 and 2.
17. The SRAM cell of claim 15 ,
wherein the first active region comprises two fin structures,
wherein the second active region comprises two fin structures,
wherein the third active region comprises a single fin structure.
18. The SRAM cell of claim 15 , further comprising:
a first landing pad disposed between the second pull-down device (PD-2) and the first pull-up device (PU-1),
wherein the first landing pad is electrically coupled to a gate structure of the second pass-gate device (PG-2) by way of a first gate via,
wherein the first landing pad extends along the first direction.
19. The SRAM cell of claim 18 , further comprising:
a first long contact, wherein a drain of the first pull-down device (PD-1), a drain of the second pull-down device (PD-2), and a drain the first pull-up device (PU-1) are electrically coupled to the first long contact.
20. The SRAM cell of claim 19 ,
wherein the first long contact extends along a second direction perpendicular to the first direction,
wherein the first landing pad spans over the first long contact.