IP Library Granted Patent US 11,459,657
Granted Patent B2
US 11,459,657 · App. 16/791,003 · Granted Oct 4, 2022

Gas supply unit and gas supply method

Inventor: Takeya Inagaki (Komaki, JP)
Assignee: CKD CORPORATION
C23C16/45561B05D3/04B05D3/0426C23C16/4405H01L23/34
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Quick Facts
Patent No.
US 11,459,657
App. No.
16/791,003
Granted
Oct 4, 2022
Kind
B2
Abstract

A gas supply unit is configured such that when a first gas whose temperature has been controlled at a first temperature is supplied to a chamber through an upper device and then a second gas which starts a chemical reaction at a reaction start temperature lower than the first temperature is supplied to the chamber through the upper device, before cleaning gas is supplied to the chamber through the defined between a base plate and the upper device to cool the upper device down to the reaction start temperature or lower.

Claims (14)

1. A gas supply unit configured to supply a first gas whose temperature has been controlled at a first temperature or a second gas that starts a chemical reaction at a reaction start temperature lower than the first temperature to a chamber, the first gas and the second gas being selectively supplied to the gas supply unit, the gas supply unit comprising:

a base plate;

an upper device supported above the base plate, the upper device having a passage through which the first gas and the second gas are selectively caused to flow;

a plurality of middle blocks placed between the base plate and the upper device and spaced from each other, the middle blocks each including a passage connected to the passage of the upper device and defining a space part between the base plate and the upper device so that the space part is formed between the middle blocks that are spaced from each other;

a first heater configured to heat the upper device at the first temperature; and

a cooling member configured to supply cooling air to the space part to cool the upper device and the middle blocks down to the reaction start temperature or lower.

2. The gas supply unit according to claim 1 , wherein the first heater is a planar heater, and the cooling member is a cooling plate member made of aluminum and placed between the first heater and the upper device so that the cooling member is in surface contact with each of the first heater and the upper device.

3. The gas supply unit according to claim 2 , wherein the cooling plate member includes a cooling passage through which the cooling air is supplied to the space part, the cooling passage being formed to extend in a direction in which the first gas flows through the gas supply unit.

4. The gas supply unit according to claim 1 further comprising a second heater, which is a planar heater, placed in contact with the upper device,

wherein the space part is defined to have a first opening in which the cooling air is supplied from the cooling member and a second opening located opposite the first opening and closed by the second heater.

5. The gas supply unit according to claim 2 further comprising a second heater, which is a planar heater, placed in contact with the upper device,

wherein the space part is defined to have a first opening in which the cooling air is supplied from the cooling member and a second opening located opposite the first opening and closed by the second heater.

6. The gas supply unit according to claim 3 further comprising a second heater, which is a planar heater, placed in contact with the upper device,

wherein the space part is defined to have a first opening in which the cooling air is supplied from the cooling member and a second opening located opposite the first opening and closed by the second heater.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 14, 2020
From: INAGAKI, TAKEYA
To: CKD CORPORATION
Reel/Frame 051820/0643 →
Priority Claims (1)
JP JP2019-040460 · Mar 6, 2019 · national
Continuity (1)
Related Publication 20200283899A1 · Sep 10, 2020