Crown capacitor and method for fabricating the same
A method for fabricating a crown capacitor includes: forming a first supporting layer over a substrate; forming a second supporting layer above the first supporting layer; alternatively stacking first and second sacrificial layers between the first and second supporting layers to collectively form a stacking structure; forming a recess extending through the stacking structure; performing an etching process to the first sacrificial layers at a first etching rate and the second sacrificial layers at a second etching rate greater than the first etching rate, such that each second sacrificial layer and immediately-adjacent two of the first sacrificial layers collectively define a concave portion; forming a first electrode layer over a surface of the recess in which the first electrode layer has a wavy structure; removing the first and second sacrificial layers; and forming a dielectric layer and a second electrode layer over the first electrode layer.
1. A crown capacitor comprising:
a substrate;
a first supporting layer disposed above the substrate;
a second supporting layer disposed above the first supporting layer and spaced apart from the first supporting layer, wherein the second supporting layer is farther from the substrate than the first supporting layer;
a first electrode layer at least partially in contact with the first and second supporting layers;
a dielectric layer disposed on two opposite surfaces of the first electrode layer and at least partially in contact with the first and second supporting layers; and
a second electrode layer disposed in contact with the dielectric layer and at two opposite sides of the first electrode layer; and
at least one five layer structure formed between the first and second supporting layers, wherein the five layer structure extends in a curved configuration and along a direction perpendicular to a top surface of the substrate, the five layer structure comprises a portion of the first electrode layer disposed between two portions of the dielectric layer and disposed between two portions of the second electrode layer, wherein the five layer structure further extends in the direction perpendicular to and away from the top surface of the substrate, and the five layer structure diverges at the second supporting layer to completely wrap around and form a closed-loop ring around a portion of the second supporting layer.
2. The crown capacitor of claim 1 , wherein the first electrode layer and the dielectric layer collectively wrap a portion of the second supporting layer.
3. The crown capacitor of claim 1 , wherein the first and second electrode layers comprise titanium nitride.
4. The crown capacitor of claim 1 , wherein the first and second supporting layers comprise silicon nitride.
5. The crown capacitor of claim 1 , wherein the five-layer structure comprises first and second pluralities of five layer curved portions respectively regularly arranged in two parallel rows, wherein the two parallel rows extend along the direction perpendicular to the top surface of the substrate.
6. The crown capacitor of claim 1 , wherein the at least one five-wavy-layer structure comprises a plurality of curved portions arranged in two rows.
7. The crown capacitor of claim 1 , wherein the five-wavy-layer structure comprises a plurality of curved portions arranged in two rows, the curved portions are symmetric with respect to the two rows.
8. A crown capacitor comprising:
a substrate;
a first supporting layer disposed above the substrate;
a second supporting layer disposed above the first supporting layer and spaced apart from the first supporting layer, wherein the second supporting layer is farther from the substrate than the first supporting layer;
a first electrode layer at least partially in contact with the first and second supporting layers;
a dielectric layer disposed on two opposite surfaces of the first electrode layer and at least partially in contact with the first and second supporting layers; and
a second electrode layer disposed in contact with the dielectric layer and at two opposite sides of the first electrode layer; and
at least one five layer structure formed between the first and second supporting layers, wherein the five layer structure extends in a curved configuration and along a direction perpendicular to a top surface of the substrate, the five layer structure comprises a portion of the first electrode layer disposed between two portions of the dielectric layer and disposed between two portions of the second electrode layer, and wherein the at least one five layer structure comprises a first row of multiple five layer curved portions higher than the first supporting layer and lower than the second supporting layer and a second row of multiple five layer curved portions higher than the first supporting layer and lower than the second supporting layer, wherein the five layer structure further extends in the direction perpendicular to and away from the top surface of the substrate, and the five layer structure diverges at the second supporting layer to completely wrap around and form a closed-loop ring around a portion of the second supporting layer.
9. The crown capacitor of claim 8 , wherein the first electrode layer and the dielectric layer collectively wrap a portion of the second supporting layer.
10. The crown capacitor of claim 8 , wherein the first and second electrode layers comprise titanium nitride.
11. The crown capacitor of claim 8 , wherein the first and second supporting layers comprise silicon nitride.
12. The crown capacitor of claim 8 , wherein the first and second rows of multiple five layer curved portions are two parallel rows, wherein the two parallel rows extend along the direction perpendicular to the top surface of the substrate.