Semiconductor device and method for manufacturing the same
A more convenient and highly reliable semiconductor device which has a transistor including an oxide semiconductor with higher impact resistance used for a variety of applications is provided. A semiconductor device has a bottom-gate transistor including a gate electrode layer, a gate insulating layer, and an oxide semiconductor layer over a substrate, an insulating layer over the transistor, and a conductive layer over the insulating layer. The insulating layer covers the oxide semiconductor layer and is in contact with the gate insulating layer. In a channel width direction of the oxide semiconductor layer, end portions of the gate insulating layer and the insulating layer are aligned with each other over the gate electrode layer, and the conductive layer covers a channel formation region of the oxide semiconductor layer and the end portions of the gate insulating layer and the insulating layer and is in contact with the gate electrode layer.
1. A semiconductor device comprising:
a driver circuit comprising:
a first semiconductor layer comprising a channel formation region of a first transistor;
a second semiconductor layer comprising a channel formation region of a second transistor;
a conductive layer;
a source electrode layer electrically connected to the first semiconductor layer and the second semiconductor layer; and
a drain electrode layer electrically connected to the first semiconductor layer and the second semiconductor layer,
wherein the first semiconductor layer and the second semiconductor layer are arranged in a first direction,
wherein the conductive layer extends beyond both side edges of the first semiconductor layer in the first direction, the first direction being the same as a channel width direction of the first transistor,
wherein one of the source electrode layer and the drain electrode layer extends beyond the both side edges of the first semiconductor layer,
wherein a channel width of the first transistor is larger than a channel length of the first transistor,
wherein a channel width of the second transistor is larger than a channel length of the second transistor,
wherein a first region of the conductive layer and the channel formation region of the first transistor overlap with each other,
wherein a second region of the conductive layer and the channel formation region of the second transistor overlap with each other,
wherein a third region of the conductive layer and the channel formation region of the first transistor does not overlap with each other,
wherein the third region of the conductive layer and the channel formation region of the second transistor does not overlap with each other, and
wherein, in a second direction perpendicular to the first direction, a width of the conductive layer in the third region is larger than a width of the conductive layer in the first region.
2. The semiconductor device according to claim 1 , further comprising:
a flexible substrate under the driver circuit.
3. A semiconductor device comprising:
a driver circuit comprising:
a first semiconductor layer comprising a channel formation region of a first transistor;
a second semiconductor layer comprising a channel formation region of a second transistor;
a conductive layer;
a source electrode layer electrically connected to the first semiconductor layer and the second semiconductor layer; and
a drain electrode layer electrically connected to the first semiconductor layer and the second semiconductor layer,
wherein the first semiconductor layer and the second semiconductor layer are arranged in a first direction,
wherein the conductive layer extends beyond both side edges of the first semiconductor layer in the first direction, the first direction being the same as a channel width direction of the first transistor,
wherein one of the source electrode layer and the drain electrode layer extends beyond the both side edges of the first semiconductor layer,
wherein a channel width of the first transistor is larger than a channel length of the first transistor,
wherein a channel width of the second transistor is larger than a channel length of the second transistor,
wherein a first region of the conductive layer and the channel formation region of the first transistor overlap with each other,
wherein a second region of the conductive layer and the channel formation region of the second transistor overlap with each other,
wherein a third region of the conductive layer and the channel formation region of the first transistor does not overlap with each other,
wherein the third region of the conductive layer and the channel formation region of the second transistor does not overlap with each other,
wherein, in a second direction perpendicular to the first direction, a width of the conductive layer in the third region is larger than a width of the conductive layer in the first region, and
wherein, in the second direction, the width of the conductive layer in the third region is smaller than a width of the first semiconductor layer.
4. The semiconductor device according to claim 3 , further comprising:
a flexible substrate under the driver circuit.