Method for manufacturing display panel, display panel, and display apparatus

1. A method for manufacturing a display panel, comprising:

forming a base structure in a target region on a base substrate;

forming a display structure layer on the base substrate on which the base structure is formed;

forming an annular groove in the display structure layer in a region which an orthographic projection of the base structure on the display structure layer falls within, the base structure being exposed in the annular groove; and

removing the base structure surrounded by the annular groove to separate the display structure layer surrounded by the annular groove from the base substrate.

2. The method according to claim 1 , wherein before forming the display structure layer on the base substrate on which the base structure is formed, the method further comprises:

forming at least one retaining wall surrounding the target region on the base substrate on which the base structure is formed; and

forming the display structure layer on the base substrate on which the base structure is formed comprises:

forming the display structure layer on the base substrate on which the at least one retaining wall is formed.

3. The method according to claim 2 , wherein forming the at least one retaining wall surrounding the target region on the base substrate on which the base structure is formed comprises:

forming a negative photoresist layer on the base substrate on which the base structure is formed; and

treating the negative photoresist layer into the at least one retaining wall surrounding the target region by an exposure process and a development process.

4. The method according to claim 2 , wherein a thickness of the retaining wall gradually increases in a direction distal from the base substrate.

5. The method according to claim 1 , wherein before forming the display structure layer on the base substrate on which the base structure is formed, the method further comprises:

forming a plurality of protrusive structures on the base structure.

6. The method according to claim 5 , wherein forming the plurality of protrusive structures on the base structure comprises:

forming a negative photoresist layer on the base substrate on which the base structure is formed; and

treating the negative photoresist layer into the plurality of protrusive structures by an exposure process and a development process.

7. The method according to claim 5 , wherein the protrusive structure is columnar, and an area of one end of the protrusive structure distal from the base substrate is greater than that of another end of the protrusive structure.

8. The method according to claim 1 , wherein before forming the display structure layer on the base substrate on which the base structure is formed, the method further comprises:

forming a plurality of protrusive structures and at least one retaining wall surrounding the target region on the base substrate on which the base structure is formed, the plurality of protrusive structures being disposed on the base structure; and

forming the display structure layer on the base substrate on which the base structure is formed comprises:

forming the display structure layer on the base substrate on which the plurality of protrusive structures and at least one retaining wall are formed.

9. The method according to claim 8 , wherein forming the plurality of protrusive structures and the at least one retaining wall surrounding the target region on the base substrate on which the base structure is formed comprises:

forming a negative photoresist layer on the base substrate on which the base structure is formed; and

treating the negative photoresist layer into the plurality of protrusive structures and the at least one retaining wall surrounding the target region by an exposure process and a development process.

10. The method according to claim 8 , wherein forming the plurality of protrusive structures and the at least one retaining wall surrounding the target region on the base substrate on which the base structure is formed comprises:

forming the plurality of protrusive structures and at least one retaining wall surrounding the target region on the base substrate on which the base structure is formed by one patterning process.

11. The method according to claim 1 , wherein a drive circuit is formed on the base substrate, a region which an orthographic projection of the drive circuit on the base substrate falls within does not overlap the target region, and one of metal structures or metal oxide structures in the drive circuit is formed by a same patterning process with the base structure.

12. The method according to claim 1 , wherein removing the base structure surrounded by the annular groove to separate the display structure layer surrounded by the annular groove from the base substrate comprises:

removing the base structure surrounded by the annular groove by a wet etching process to separate the display structure layer surrounded by the annular groove from the base substrate.

13. The method according to claim 1 , wherein the base structure is made of a positive photoresist, and removing the base structure surrounded by the annular groove to separate the display structure layer surrounded by the annular groove from the base substrate comprises:

exposing the base structure from a side where the base substrate is not provided with the base structure; and

removing the base structure surrounded by the annular groove by a development process to separate the display structure layer surrounded by the annular groove from the base substrate.

14. The method according to claim 1 , wherein before forming the base structure on the base substrate, the method further comprises:

forming a buffer layer on the base substrate; and

forming the base structure on the base substrate comprises:

forming the base structure on the base substrate on which the buffer layer is formed.

15. The method according to claim 1 , wherein forming the annular groove in the display structure layer in the region which the orthographic projection of the base structure on the display structure layer falls within, comprises:

forming the annular groove by laser cutting in the display structure layer in the region which the orthographic projection of the base structure on the display structure layer falls within.

16. The method according to claim 1 , before forming the base structure on the base substrate, the method further comprises:

forming a buffer layer on the base substrate;

forming the base structure on the base substrate comprises:

forming the base structure on the base substrate on which the buffer layer is formed;

before forming the display structure layer on the base substrate on which the base structure is formed, the method further comprises:

forming a negative photoresist layer on the base substrate on which the base structure is formed; and

treating the negative photoresist layer into a plurality of protrusive structures and at least one retaining wall surrounding the target region by an exposure process and a development process, the plurality of protrusive structures being disposed on the base structure, the protrusive structure being columnar, an area of one end of the protrusive structure distal from the base substrate being greater than that of another end of the protrusive structure, and a thickness of the retaining wall gradually increasing in a direction distal from the base substrate; and

forming the display structure layer on the base substrate on which the base structure is formed comprises:

forming the display structure layer on the base substrate on which the plurality of protrusive structures and at least one retaining wall are formed;

wherein a drive circuit is formed on the base substrate, a region which an orthographic projection of the drive circuit on the base substrate falls within does not overlap the target area, and one of metal structures or metal oxide structures in the drive circuit is formed by a same patterning process with the base structure.