IP Library Granted Patent US 11,532,921
Granted Patent B2
US 11,532,921 · App. 16/863,277 · Granted Dec 20, 2022

Laser device

Inventors: Hsin-Chan Chung (Hsinchu, TW); Shou-Lung Chen (Hsinchu, TW)
Assignees: EPISTAR CORPORATION; iReach Corporation
H01S5/04257H01S5/023H01S5/028H01S5/0225H01S5/0233H01S5/0235H01S5/04252H01S5/04254H01S5/183
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Quick Facts
Patent No.
US 11,532,921
App. No.
16/863,277
Filed
Apr 30, 2020
Granted
Dec 20, 2022
Kind
B2
Art Unit
2828
USPC
372/44.01
Abstract

A semiconductor device includes a substrate, an epitaxial stack disposed on the substrate, a first connection layer between the epitaxial stack and the substrate and a first electrode disposed on the first connection layer. The substrate has a first side surface and a second side surface. The epitaxial stack has a semiconductor structure with a first lateral surface adjacent to the first side surface and a second lateral surface opposing the first lateral surface and adjacent to the second side surface. The first connection layer has a first protruding portion extending beyond the first lateral surface and a second protruding portion extending beyond the second lateral surface. The first electrode is in contact with the first protruding portion and the second protruding portion.

Claims (31)

1. A semiconductor device, comprising:

a substrate having a first side surface and a second side surface;

an epitaxial stack disposed on the substrate and having a semiconductor structure with a first lateral surface adjacent to the first side surface and a second lateral surface opposing the first lateral surface and adjacent to the second side surface;

a first connection layer between the epitaxial stack and the substrate, and having a first protruding portion extending beyond the first lateral surface and a second protruding portion extending beyond the second lateral surface; and

a first electrode disposed on the first connection layer and being in contact with the first protruding portion and the second protruding portion.

2. The semiconductor device of claim 1 , wherein the first electrode comprises

a body portion; and

a surrounding portion connected to the body portion and covering the first lateral surface and the second lateral surface.

3. The semiconductor device of claim 2 , further comprising a second electrode disposed on the epitaxial stack, wherein the first electrode and the second electrode are disposed on the same side of the substrate.

4. The semiconductor device of claim 3 , wherein the first electrode surrounds the second electrode.

5. The semiconductor device of claim 3 , further comprising a second connection layer on the epitaxial stack and having a first width, wherein the semiconductor structure has a second width less than the first width.

6. The semiconductor device of claim 3 , further comprising a first gap between the body portion and the second electrode, and a second gap between the surrounding portion and the second electrode, wherein the second gap is narrower than the first gap.

7. The semiconductor device of claim 1 , further comprising an insulating layer covering the first connection layer and having a first opening portion on the first protruding portion and a second opening portion on the second protruding portion.

8. The semiconductor device of claim 1 , further comprising an insulating layer having a first opening portion shaped as a ring.

9. The semiconductor device of claim 8 , wherein the first electrode comprises

a body portion; and

a surrounding portion connected to the body portion and having the same shape as the first opening portion.

10. The semiconductor device of claim 9 , wherein the surrounding portion has a larger area than the first opening portion in a plan view.

11. The semiconductor device of claim 1 , in a cross-sectional view, further comprising a first distance between the first lateral surface and the first side surface and a second distance between the second lateral surface and the second side surface, wherein a difference between the first distance and the second distance is less than 30% of the first distance.

12. The semiconductor device of claim 1 , in a cross-sectional view, further comprising a first distance between the first lateral surface and the first side surface and a second distance between the second lateral surface and the second side surface, wherein the first distance is equal to the second distance.

13. The semiconductor device of claim 1 , wherein the epitaxial stack comprises a plurality of columnar bodies.

14. The semiconductor device of claim 13 , wherein the plurality of columnar bodies has a first edge near the first side surface, and the first lateral surface is closer to the first side surface than the first edge.

15. The semiconductor device of claim 1 , wherein the first electrode has a height less than 8.5 μm.

16. The semiconductor device of claim 1 , further comprising an adhesive layer between the substrate and the epitaxial stack.

17. The semiconductor device of claim 1 , further comprising a first pad structure covering the first electrode and having a material different from that of the first electrode.

18. The semiconductor device of claim 1 , wherein the semiconductor device emits a coherent light.

19. The semiconductor device of claim 1 , further comprising an anti-reflection layer covering the substrate.

20. A semiconductor apparatus comprising:

a circuit board;

a semiconductor device of claim 1 on the circuit board; and

an optical array on the semiconductor device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 1, 2020
From: CHUNG, HSIN-CHAN; CHEN, SHOU-LUNG
To: EPISTAR CORPORATION; IREACH CORPORATION
Reel/Frame 052550/0171 →
Priority Claims (1)
TW 108115024 · Apr 30, 2019 · national
Continuity (1)
Related Publication 20200350742A1 · Nov 5, 2020