Antireflection film
The present invention relates to an antireflection film. The antireflection film includes a low refractive index layer having excellent alkali resistance and exhibiting remarkably improved mechanical properties such as scratch resistance and impact resistance as well as reduction of a glare phenomenon, and a base film exhibiting excellent mechanical strength and water resistance in spite of a thin thickness and having no fear of interference fringes occurring. Therefore, such antireflection film can be used as a protective film of a polarizing plate or used as any other component so as to provide a thin display device, and furthermore, can effectively prevent the glare phenomenon of the display device, and can more improve the durability and lifespan thereof.
1. An antireflection film comprising:
a polyester film having an in-plane retardation value (Rin) of 3000 nm to 30,000 nm in which a ratio (Rin/Rth) of the in-plane retardation value (Rin) to a thickness-direction retardation value (Rth) is 0.2 to 1.2;
a low refractive index layer which is disposed on the polyester film and which comprises a crosslinked polymer of a photocurable coating composition comprising
a photopolymerizable compound comprising a monomer or oligomer containing a (meth)acryloyl group,
a fluorine-based compound containing a photoreactive functional group,
an inorganic particle, and
a polyhedral oligomeric polysilsesquioxane (POSS) having a cage structure in which at least one reactive functional group is substituted; and
a hard coating layer between the polyester film and the low refraction index layer,
wherein the photocurable coating composition contains the POSS having a cage structure in which at least one reactive functional group is substituted, in an amount of 2 to 27 parts by weight based on 100 parts by weight of the photopolymerizable compound, and
wherein the photopolymerizable compound is included in an amount of 13 wt % to 80 wt % with respect to the solid content of the photocurable coating composition,
wherein the fluorine-based compound containing a photoreactive function group is not included in the photopolymerizable compound, and
wherein the photocurable coating composition includes 1 to 75 parts by weight of the fluorine-based compound containing the photoreactive functional group based on 100 parts by weight of the photopolymerizable compound.
2. The antireflection film of claim 1 ,
wherein the polyester film is a uniaxially stretched film or a biaxially stretched film of polyethylene terephthalate or polyethylene naphthalate.
3. The antireflection film of claim 1 ,
wherein the reactive functional group substituted in the POSS comprises at least one functional group selected from the group consisting of an alcohol, an amine, a carboxylic acid, an epoxide, an imide, a (meth)acrylate, a nitrile, a norbornene, an olefin, a polyethylene glycol, a thiol, and a vinyl group.
4. The antireflection film of claim 1 ,
wherein the photoreactive functional group of the fluorine-based compound is at least one functional group selected from the group consisting of a (meth)acryloyl group, an epoxy group, a vinyl group, and a mercapto group.
5. The antireflection film of claim 1 ,
wherein the fluorine-based compound containing the photoreactive functional group has a weight average molecular weight of 2,000 to 200,000 g/mol.
6. The antireflection film of claim 1 ,
wherein the inorganic particle includes a hollow silica particle having a number average particle diameter of 10 nm to 100 nm.
7. The antireflection film of claim 6 ,
wherein the photocurable coating composition includes 10 to 350 parts by weight of the hollow silica nanoparticle based on 100 parts by weight of the photopolymerizable compound.
8. The antireflection film of claim 1 ,
wherein the hard coating layer is provided with a function selected from the group consisting of an antiglare function, a scratch prevention function, an antistatic function, and any combination thereof.