Control method of movable body, exposure method, device manufacturing method, movable body apparatus, and exposure apparatus
In a beam irradiation apparatus in which a movable body holds an object, a mark detection system detects a first mark on the movable body while moving the movable body in a first direction and changing an irradiation position of a measurement beam in the first direction, the mark detection system detects a second mark while moving the movable body in the first direction and changing the irradiation position of the measurement beam in the first direction, a controller controls a position of the movable body in a second direction intersecting the first direction during a time period between the detection of the first mark and the detection of the second mark, and the controller controls the movement of the movable body to adjust a positional relation between the object on the movable body and a processing beam, based on results of the detection of the first and second marks.
1. A measurement device that detects a position of a grating mark, the device comprising:
an irradiation system irradiating, obliquely with a measurement beam, the grating mark provided at an object; and
a beam receiving system receiving, from the grating mark, a diffraction beam via an objective optical system, the diffraction beam being caused by the irradiating of the measurement beam obliquely to the grating mark.
2. The measurement device of claim 1 , wherein:
the grating mark has a pitch in a first direction of a first axis on a first plane,
the measurement beam propagates along a second axis,
the diffraction beam propagates along a third axis, and
a fourth axis is perpendicular to the first plane.
3. The measurement device of claim 2 , wherein the second axis is between the third axis and the fourth axis that is perpendicular to the first plane.
4. The measurement device of claim 2 , wherein the fourth axis is an optical axis of the objective optical system.
5. The measurement device of claim 4 , wherein, with respect to the optical axis, the third axis is positioned closer to the second axis than a reflection axis along which propagates a zeroth diffraction beam caused by the irradiating of the measurement beam at the grating mark.
6. The measurement device of claim 5 , wherein:
a first space and a second space are located at a grating mark side of the objective optical system,
the second and third axes are located in the first space, and
the reflection axis is located in the second space.
7. The measurement device of claim 4 , wherein a first angle between the optical axis and the second axis is larger than a second angle between the optical axis and the third axis.
8. The measurement device of claim 2 , wherein the second axis and the third axis intersect at the grating mark.
9. The measurement device of claim 1 , wherein the irradiation system irradiates a plurality of the measurement beams obliquely on the grating mark.
10. The measurement device of claim 9 , wherein the irradiation system irradiates the plurality of measurement beams obliquely on the grating mark from a plurality of directions.
11. The measurement device of claim 10 , wherein the irradiation system irradiates four of the measurement beams obliquely on the grating mark from four directions.
12. The measurement device of claim 2 , wherein the grating mark has a period direction, which is the same as a direction from a first point of intersection of the second axis and a pupil plane of the objective optical system to a second point of intersection of the third axis and the pupil plane.
13. The measurement device of claim 2 , wherein:
the irradiation system irradiates the grating mark with the measurement beam via the objective optical system, and
the object at which the grating mark is provided is moved along the first direction while moving the measurement beam in the first direction with respect to the grating mark.
14. The measurement device according to claim 13 , wherein
the measurement beam is transmitted through a center portion of the objective optical system and is irradiated on the grating mark.
15. The measurement device according to claim 14 , wherein the measurement beam transmitted through the center portion of the objective optical system is irradiated on the grating mark from the second direction intersecting the first direction.
16. The measurement device according to claim 13 , further comprising:
a control system that controls a moving velocity of the measurement beam.
17. The measurement device according to claim 16 , wherein the control system further controls a movement velocity of the object that is moved.
18. The measurement device according to claim 1 , further comprising a calculation system that obtains positional information of the grating mark based on the diffraction beam received by the beam receiving system.
19. An exposure apparatus, comprising:
the measurement device according to claim 18 ;
a position control device that controls a position of the object based on the positional information obtained by the calculation system; and
a pattern formation device that forms a predetermined pattern on the object by irradiating the object with an energy beam.
20. A measurement method of measuring positional information of a grating mark provided at an object, the method comprising:
irradiating, obliquely with a measurement beam, the grating mark provided at the object; and
receiving, from the grating mark and with a beam receiving system, a diffraction beam of the measurement beam via an objective optical system, the diffraction beam being caused by the irradiating of the measurement beam obliquely to the grating mark.