IP Library Granted Patent US 11,569,482
Granted Patent B2
US 11,569,482 · App. 16/772,937 · Granted Jan 31, 2023

Display panel and manufacturing method thereof, display device

Inventors: Hui Tong (Beijing, CN); Yongfa Dong (Beijing, CN); Qing Wang (Beijing, CN); Kuanta Huang (Beijing, CN)
Assignee: Beijing BOE Technology Development Co., Ltd.
H01L51/5271H01L27/322H01L27/3258H01L51/5206H01L51/5234H01L51/56H01L2227/323H01L2251/308H01L2251/5315H01L2251/556H01L2251/558
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Quick Facts
Patent No.
US 11,569,482
App. No.
16/772,937
Granted
Jan 31, 2023
Kind
B2
Abstract

Disclosed are a display panel, a manufacturing method thereof, and a display device. The display panel includes a base substrate and sub-pixels thereon. At least one sub-pixel includes: a light emitting element including a first electrode, a luminous functional layer and a second electrode sequentially stacked, the first electrode being closer to the base substrate than the second electrode; a metal reflective layer, between the base substrate and the first electrode; a silicon nitride layer, between the first electrode and the metal reflective layer, and including a first via hole through which the first electrode is connected with the metal reflective layer; a driving circuit including a driving transistor and a storage capacitor between the base substrate and the metal reflective layer, the driving transistor including a gate electrode connected with the storage capacitor, and source and drain electrodes, one of which is connected with the metal reflective layer.

Claims (36)

1. A display panel, comprising a base substrate and a plurality of sub-pixels on one side of the base substrate, wherein at least one of the plurality of sub-pixels comprises:

a light emitting element, comprising a first electrode, a luminous functional layer and a second electrode that are sequentially stacked, wherein the first electrode is closer to the base substrate than the second electrode;

a metal reflective layer between the base substrate and the first electrode;

a silicon nitride layer between the first electrode and the metal reflective layer, wherein the silicon nitride layer is in direct contact with the metal reflective layer, the silicon nitride layer comprises a first via hole, and the first electrode is electrically connected with the metal reflective layer through the first via hole; and

a driving circuit between the base substrate and the metal reflective layer, wherein the driving circuit comprises a driving transistor and a storage capacitor, the driving transistor comprises a source electrode, a drain electrode and a gate electrode, one of the source electrode and the drain electrode is electrically connected with the metal reflective layer, the gate electrode is electrically connected with the storage capacitor, and the storage capacitor is configured to store a data signal.

2. The display panel according to claim 1 , wherein a deposition temperature of the silicon nitride layer is in the range of 70-100 degrees Celsius.

3. The display panel according to claim 2 , wherein the deposition temperature of the silicon nitride layer is in a range of 80-85 degrees Celsius.

4. The display panel according to claim 1 , wherein a thickness of the silicon nitride layer is in a range of 50-100 Å.

5. The display panel according to claim 1 , wherein a material of the metal reflective layer comprises a metallic material containing silver or aluminum.

6. The display panel according to claim 1 , wherein a thickness of the metal reflective layer is in a range of 300-500 Å.

7. The display panel according to claim 1 , wherein the first electrode is a transparent electrode.

8. The display panel according to claim 7 , wherein a material of the first electrode comprises at least one selected from the group consisting of indium tin oxide (ITO), zinc tin oxide (IZO), indium gallium tin oxide (IGZO), and indium zinc tin oxide (IZTO).

9. The display panel according to claim 1 , wherein a thickness of the first electrode is in a range of 700-2000 Å.

10. The display panel according to claim 1 , wherein a structure comprising the metal reflective layer, the silicon nitride layer and the first electrode, has a surface roughness of less than 3.0 nm.

11. The display panel according to claim 1 , wherein the second electrode is a transparent electrode.

12. The display panel according to claim 1 , further comprising: a first encapsulation layer, a color filter layer, a second encapsulation layer and a cover plate that are sequentially stacked and on one side of the light emitting element away from the base substrate.

13. The display panel according to claim 12 , wherein the light emitting element is configured to emit white light, and the color filter layer comprises a red filter unit, a green filter unit and a blue filter unit.

14. The display panel according to claim 1 , wherein the base substrate is a silicon-based base substrate.

15. The display panel according to claim 1 , further comprising a second via hole, wherein the one of the source electrode and the drain electrode is electrically connected with the metal reflective layer through the second via hole.

16. The display panel according to claim 1 , further comprising an anti-oxidation layer, wherein the anti-oxidation layer is between the base substrate and the metal reflective layer, and the anti-oxidation layer is in direct contact with the metal reflective layer.

17. A display device, comprising a display panel, wherein the display panel comprises a base substrate and a plurality of sub-pixels on one side of the base substrate, and

at least one of the plurality of sub-pixels comprises:

a light emitting element, comprising a first electrode, a luminous functional layer and a second electrode that are sequentially stacked, wherein the first electrode is closer to the base substrate than the second electrode;

a metal reflective layer between the base substrate and the first electrode;

a silicon nitride layer between the first electrode and the metal reflective layer, wherein the silicon nitride layer is in direct contact with the metal reflective layer, the silicon nitride layer comprises a first via hole, and the first electrode is electrically connected with the metal reflective layer through the first via hole; and

a driving circuit between the base substrate and the metal reflective layer, wherein the driving circuit comprises a driving transistor and a storage capacitor, the driving transistor comprises a source electrode, a drain electrode and a gate electrode, one of the source electrode and the drain electrode is electrically connected with the metal reflective layer, the gate electrode is electrically connected with the storage capacitor, and the storage capacitor is configured to store a data signal.

18. A manufacturing method of a display panel, comprising:

providing a base substrate, wherein a driving circuit is formed on the base substrate, the driving circuit comprises a driving transistor and a storage capacitor, the driving transistor comprises a source electrode, a drain electrode and a gate electrode, and the gate electrode is electrically connected with the storage capacitor;

forming a metal reflective layer on one side of the driving circuit away from the base substrate, and making one of the source electrode and the drain electrode be electrically connected with the metal reflective layer;

forming a silicon nitride layer on one side of the metal reflective layer away from the base substrate, and forming a first via hole in the silicon nitride layer; and

forming, on one side of the silicon nitride layer away from the base substrate, a light emitting element which comprises a first electrode, a luminous functional layer and a second electrode that are sequentially stacked, and making the first electrode be electrically connected with the metal reflective layer through the first via hole.

19. The manufacturing method according to claim 18 , further comprising:

forming a second via hole on one side of the driving circuit away from the base substrate, before the forming the metal reflective layer on one side of the driving circuit away from the base substrate;

wherein the one of the source electrode and the drain electrode is electrically connected with the metal reflective layer through the second via hole.

20. The manufacturing method according to claim 18 , further comprising:

sequentially forming a first encapsulation layer, a color filter layer, a second encapsulation layer and a cover plate on one side of the light emitting element away from the base substrate.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 29, 2022
From: BOE TECHNOLOGY GROUP CO., LTD.
To: BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
Reel/Frame 061251/0304 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 15, 2020
From: TONG, HUI; DONG, YONGFA; WANG, QING; HUANG, KUANTA
To: BOE TECHNOLOGY GROUP CO., LTD.
Reel/Frame 052939/0445 →
Continuity (1)
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