Imprint apparatus and article manufacturing method

1. An imprint apparatus operable to perform an imprint process, which is for forming a pattern on an imprint material on a substrate by using a mold, for each of shot regions of the substrate, the apparatus comprising:

a movable stage configured to hold the substrate;

a detector configured to detect a positional deviation between the mold and the substrate;

a curing device configured to cure an imprint material on the substrate; and

a controller configured to control alignment between the mold and the substrate and to control the curing device,

wherein the controller is configured to:

determine a target position based on the positional deviation detected by the detector;

start control of movement of the stage towards the determined target position without feeding back detection results of the detector;

obtain a change in the positional deviation between the mold and the substrate detected by the detector while the stage is being moved towards the determined target position without feeding back the detection results of the detector, and predict, while the stage is being moved towards the determined target position without feeding back the detection results of the detector, a timing at which the positional deviation between the mold and the substrate will fall within an allowable range based on the obtained change in the positional deviation between the mold and the substrate detected by the detector while controlling the movement of the stage towards the determined target position without feeding back the detection results of the detector; and

start curing of the imprint material by the curing device at the timing predicted while the stage is being moved towards the determined target position without feeding back the detection results of the detector,

wherein the movement of the stage is performed in a state where the mold and the imprint material on the substrate are in contact with each other.

2. The imprint apparatus according to claim 1 , wherein the movement of the stage is a linear movement towards the target position or a reciprocal movement of the linear movement.

3. The imprint apparatus according to claim 1 , wherein the controller is configured to determine whether or not the prediction based on the change is possible, and repeat the movement until it is determined that the prediction is possible.

4. The imprint apparatus according to claim 1 , wherein

in a case where an X axis and a Y axis are directions that are orthogonal to one another in a plane parallel to a surface of the substrate, and a Z axis is a direction orthogonal to the X axis and the Y axis,

the controller is configured to independently control each component of movement in the X-axis direction, movement in the Y-axis direction, and rotation about the Z axis in movement of the stage.

5. The imprint apparatus according to claim 4 , wherein the controller is configured to start driving simultaneously for each component of the movement in the X-axis direction, the movement in the Y-axis direction, and the rotation about the Z axis in movement of the stage.

6. The imprint apparatus according to claim 4 , wherein the controller is configured to, for each component of the movement in the X-axis direction, the movement in the Y-axis direction, and the rotation about the Z axis in movement of the stage, predict a timing at which the positional deviation detected by the detector will fall within the allowable range, and adjust the timing at which to start driving for each component based on the respective predicted timings.

7. The imprint apparatus according to claim 1 , wherein the controller is configured to determine the target position by adding a predetermined additional amount to a movement amount of the stage according to the positional deviation detected by the detector, and

wherein the controller is configured to adjust the predetermined additional amount based on the timing determined in the imprint process performed in another shot region different to a target shot region.

8. An article manufacturing method comprising:

using an imprint apparatus to form a pattern on a substrate;

processing the substrate on which the pattern has been formed; and

manufacturing an article from the processed substrate,

wherein the imprint apparatus is operable to perform an imprint process, which is for forming a pattern on an imprint material on the substrate by using a mold, for each of shot regions of the substrate, the imprint apparatus comprises:

a movable stage configured to hold the substrate;

a detector configured to detect a positional deviation between the mold and the substrate;

a curing device configured to cure an imprint material on the substrate; and

a controller configured to control alignment between the mold and the substrate and to control the curing device,

wherein the controller is configured to:

determine a target position based on the positional deviation detected by the detector;

start control of movement of the stage towards the determined target position without feeding back detection results of the detector;

obtain a change in the positional deviation between the mold and the substrate detected by the detector while the stage is being moved towards the determined target position without feeding back the detection results of the detector, and predict, while the stage is being moved towards the determined target position without feeding back the detection results of the detector, a timing at which the positional deviation between the mold and the substrate will fall within an allowable range based on the obtained change in the positional deviation between the mold and the substrate detected by the detector while controlling the movement of the stage towards the determined target position without feeding back the detection results of the detector; and

start curing of the imprint material by the curing device at the timing predicted while the stage is being moved towards the determined target position without feeding back the detection results of the detector,

wherein the movement of the stage is performed in a state where the mold and the imprint material on the substrate are in contact with each other.

9. The imprint apparatus according to claim 1 , wherein the controller is configured to determine the target position by adding a predetermined additional amount to a movement amount of the stage according to the positional deviation detected by the detector.

10. The imprint apparatus according to claim 1 , wherein the controller is configured to predict the timing at which the positional deviation between the mold and the substrate will fall within the allowable range based on a plurality of measurement values (i) that are obtained by the detector while controlling the movement of the stage towards the determined target position without feeding back the detection results of the detector and (ii) that exhibit a linear change.

11. The imprint apparatus according to claim 1 , wherein the controller is configured to predict the timing at which the positional deviation between the mold and the substrate will fall within the allowable range based on a plurality of measurement values (i) that are obtained by the detector while controlling the movement of the stage towards the determined target position without feeding back the detection results of the detector and (ii) that exhibit a periodic change.