IP Library Granted Patent US 11,769,855
Granted Patent B2
US 11,769,855 · App. 17/194,942 · Granted Sep 26, 2023

Micro light emitting device and display apparatus having the same

Inventors: Kyungwook Hwang (Seoul, KR); Junsik Hwang (Hwaseong-si, KR); Seogwoo Hong (Yongin-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H01L33/04H01L25/0753H01L33/12H01L33/14H01L33/16H01L33/32H01L33/62H01L33/50
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Quick Facts
Patent No.
US 11,769,855
App. No.
17/194,942
Granted
Sep 26, 2023
Kind
B2
Abstract

Provided is a micro light emitting device and a display apparatus having the micro light emitting device. The micro light emitting device includes a first-type semiconductor layer provided on a substrate, a superlattice layer provided on the first-type semiconductor layer, a current blocking layer provided on a side portion of the superlattice layer, an active layer provided on the superlattice layer and the current blocking layer, and a second-type semiconductor layer provided on the active layer.

Claims (63)

1. A micro light emitting device comprising:

a substrate;

a first-type semiconductor layer provided on the substrate;

a superlattice layer provided on the first-type semiconductor layer;

a current blocking layer provided at a side portion of the superlattice layer;

an active layer directly provided on the superlattice layer and the current blocking layer;

a second-type semiconductor layer provided on the active layer,

wherein the superlattice layer has a first layer and a second layer that are alternatively stacked, and the superlattice layer has a bandgap greater than the active layer.

2. The micro light emitting device of claim 1 , wherein the current blocking layer comprises a porous layer or an air layer.

3. The micro light emitting device of claim 2 , wherein the porous layer comprises a gallium nitride.

4. The micro light emitting device of claim 1 , wherein the current blocking layer comprises:

a porous layer that contacts the side portion of the superlattice layer; and

an air layer provided on a side portion of the porous layer.

5. The micro light emitting device of claim 1 , wherein the current blocking layer extends from the side portion of the superlattice layer to a side portion of the first-type semiconductor layer or a bottom of the first-type semiconductor layer.

6. The micro light emitting device of claim 1 , wherein the current blocking layer extends from the side portion of the superlattice layer to a side portion of the active layer.

7. The micro light emitting device of claim 1 , further comprising a nano rod type micro light emitting device.

8. The micro light emitting device of claim 1 , wherein the current blocking layer is provided extending from the side portion of the superlattice layer to a side portion of the first-type semiconductor layer or a bottom of the first-type semiconductor layer.

9. The micro light emitting device of claim 1 , further comprising a protection layer provided on a side wall of the active layer, a side wall of the second-type semiconductor layer, and an exposed surface of the current blocking layer.

10. The micro light emitting device of claim 1 , further comprising a via hole that extends through the second-type semiconductor layer, the active layer and the current blocking layer and into the first-type semiconductor layer.

11. The micro light emitting device of claim 10 , wherein the current blocking layer is further provided along a circumference of the via hole of the first-type semiconductor layer.

12. The micro light emitting device of claim 1 , wherein the micro light emitting device has a diameter of about 200 μm or less.

13. The micro light emitting device of claim 1 , wherein the superlattice layer comprises InGaN layers and GaN layers that are alternately stacked.

14. A display apparatus comprising:

a driving circuit substrate; and

a plurality of micro light emitting devices arranged to be electrically connected to the driving circuit substrate,

wherein each of the plurality of micro light emitting devices comprises:

a first-type semiconductor layer,

a superlattice layer provided on the first-type semiconductor layer,

a current blocking layer provided on a side portion of the superlattice layer,

an active layer directly provided on the superlattice layer and the current blocking layer, and

a second-type semiconductor layer provided on the active layer, and

wherein the superlattice layer has a first layer and a second layer that are alternatively stacked, and the superlattice layer has a bandgap greater than the active layer.

15. The display apparatus of claim 14 , wherein the current blocking layer comprises a porous layer or an air layer.

16. The display apparatus of claim 15 , wherein the porous layer comprises a gallium nitride.

17. The display apparatus of claim 14 , wherein the current blocking layer comprises:

a porous layer that contacts the side portion of the superlattice layer; and

an air layer provided on a side portion of the porous layer.

18. The display apparatus of claim 14 , wherein the current blocking layer extends from the side portion of the superlattice layer to a side portion of the first-type semiconductor layer or a bottom of the first-type semiconductor layer.

19. The display apparatus of claim 14 , wherein the current blocking layer extends from the side portion of the superlattice layer to a side portion of the active layer.

20. The display apparatus of claim 14 , wherein the current blocking layer extends from the side portion of the superlattice layer to a side portion of the first-type semiconductor layer or a bottom of the first-type semiconductor layer.

21. The display apparatus of claim 14 , further comprising a protection layer on a side wall of the active layer, a sidewall of the second-type semiconductor layer, and an exposed surface of the current blocking layer.

22. The display apparatus of claim 14 , further comprising a via hole penetrating from the second-type semiconductor layer to the first-type semiconductor layer, wherein the current blocking layer is provided around the via hole of the superlattice layer.

23. The display apparatus of claim 14 , wherein each micro light emitting device of the plurality of micro light emitting devices has a diameter of about 200 μm or less.

24. The display apparatus of claim 14 , wherein the superlattice layer comprises InGaN layers and GaN layers that are alternately stacked.

25. The display apparatus of claim 14 , further comprising a color conversion layer configured to change a color of light emitted from the plurality of micro light emitting devices.

26. The display apparatus of claim 14 , wherein the display apparatus is applied to a micro LED TV, a digital signage, a mobile display apparatus, a wearable display apparatus, a virtual reality apparatus, or an augmented reality apparatus.

27. A micro light emitting device comprising:

a substrate;

a first semiconductor layer provided on the substrate;

a superlattice layer provided on the first semiconductor layer;

a high resistance layer surrounding at least a portion of a peripheral region the superlattice layer;

an active layer directly provided on the superlattice layer; and

a second semiconductor layer provided on the active layer,

wherein the high resistance layer has a higher resistance than the superlattice layer, and

wherein the superlattice layer has a first layer and a second layer that are alternatively stacked, and the superlattice layer has a bandgap greater than the active layer.

28. A micro light emitting device comprising:

a substrate;

a first semiconductor layer provided on the substrate;

a superlattice layer provided on a first portion of a first surface of the first semiconductor a high resistance layer provided on a second portion of the first surface of the first semiconductor layer;

an active layer directly provided on the superlattice layer; and

a second semiconductor layer provided on the active layer,

wherein the high resistance layer has a higher resistance than the superlattice layer, and

wherein the superlattice layer has a first layer and a second layer that are alternatively stacked, and the superlattice layer has a bandgap greater than the active layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 8, 2021
From: HWANG, KYUNGWOOK; HWANG, JUNSIK; HONG, SEOGWOO
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 055526/0647 →
Priority Claims (1)
KR 10-2020-0114854 · Sep 8, 2020 · national
Continuity (1)
Related Publication 20220077346A1 · Mar 10, 2022