Integrated circuit device
An integrated circuit device including a first electrode layer including a first metal and having a first thermal expansion coefficient; a dielectric layer on the first electrode layer, the dielectric layer including a second metal oxide including a second metal that is different from the first metal, and having a second thermal expansion coefficient that is less than the first thermal expansion coefficient; and a first stress buffer layer between the first electrode layer and the dielectric layer, the first stress buffer layer including a first metal oxide including the first metal, and being formed due to thermal stress of the first electrode layer and thermal stress of the dielectric layer.
1. An integrated circuit device, comprising:
a first electrode layer including a first metal and having a first thermal expansion coefficient;
a dielectric layer on the first electrode layer, the dielectric layer including a second metal oxide including a second metal that is different from the first metal, and having a second thermal expansion coefficient that is less than the first thermal expansion coefficient;
a first stress buffer layer between the first electrode layer and the dielectric layer, the first stress buffer layer:
including a first metal oxide including the first metal,
directly contacting the dielectric layer, and
being formed due to thermal stress of the first electrode layer and thermal stress of the dielectric layer; and
a second stress buffer layer between the first electrode layer and the first stress buffer layer, the second stress buffer layer including a third metal oxide including a third metal that is different from the second metal.
2. The integrated circuit device as claimed in claim 1 , wherein the first stress buffer layer has a rutile-shaped tetragonal crystal structure.
3. The integrated circuit device as claimed in claim 1 , wherein the first stress buffer layer includes an interface layer at an interface between the first electrode layer and the dielectric layer.
4. The integrated circuit device as claimed in claim 1 , wherein the dielectric layer and the first stress buffer layer include a crystalline layer.
5. The integrated circuit device as claimed in claim 1 , wherein a thickness of the first stress buffer layer is less than a thickness of the dielectric layer.
6. The integrated circuit device as claimed in claim 1 , wherein a difference between the first thermal expansion coefficient and the second thermal expansion coefficient is about 3.0×10 −6 /K to about 8.0×10 −6 /K.
7. The integrated circuit device as claimed in claim 1 , wherein lattice mismatch between the first metal oxide constituting the first stress buffer layer and the second metal oxide constituting the dielectric layer is 7% or less.
8. The integrated circuit device as claimed in claim 1 , wherein the dielectric layer has a tetragonal crystal structure.
9. The integrated circuit device as claimed in claim 1 , wherein the first metal includes a transition metal or a post-transition metal.
10. The integrated circuit device as claimed in claim 1 , wherein the first electrode layer includes a metal film including the first metal, a metal nitride film including the first metal, or a combination thereof.
11. The integrated circuit device as claimed in claim 1 , wherein:
the first metal oxide includes titanium oxide, chromium oxide, niobium oxide, ruthenium oxide, or nickel oxide, and
the second metal oxide includes hafnium oxide or zirconium oxide.
12. An integrated circuit device, comprising:
a first electrode layer including a first metal and having a first thermal expansion coefficient;
a dielectric layer on the first electrode layer, the dielectric layer including a second metal oxide including a second metal that is different from the first metal, and having a second thermal expansion coefficient that is less than the first thermal expansion coefficient;
a first stress buffer layer between the first electrode layer and the dielectric layer, the first stress buffer layer:
including a first metal oxide including the first metal, and
being formed due to thermal stress of the first electrode layer and thermal stress of the dielectric layer; and
a second stress buffer layer between the first electrode layer and the first stress buffer layer, the second stress buffer layer including a third metal oxide including a third metal that is different from the second metal.
13. The integrated circuit device as claimed in claim 12 , wherein the first stress buffer layer has a rutile-shaped tetragonal crystal structure.
14. The integrated circuit device as claimed in claim 13 , wherein:
the second stress buffer layer is formed by thermal stress of the first electrode layer and thermal stress of the dielectric layer, and
the second stress buffer layer has a rutile-shaped tetragonal crystal structure that is the same as that of the first stress buffer layer.
15. The integrated circuit device as claimed in claim 12 , wherein:
the second stress buffer layer includes an interface layer at an interface between the first electrode layer and the first stress buffer layer, and
the dielectric layer, the first stress buffer layer, and the second stress buffer layer include crystalline layers.
16. The integrated circuit device as claimed in claim 12 , wherein the first metal and the third metal each independently include a transition metal or a post-transition metal.
17. An integrated circuit device, comprising:
a lower electrode layer including a first metal and having a first thermal expansion coefficient;
an upper electrode layer above the lower electrode layer and facing the lower electrode layer; and
a dielectric structure between the lower electrode layer and the upper electrode layer,
wherein the dielectric structure includes:
a dielectric layer on the lower electrode layer, the dielectric layer including a second metal oxide including a second metal that is different from the first metal, and having a second thermal expansion coefficient that is less than the first thermal expansion coefficient;
a first stress buffer layer between the lower electrode layer and the dielectric layer, the first stress buffer layer:
including a first metal oxide including the first metal, and
being formed due to thermal stress of the lower electrode layer and thermal stress of the dielectric layer; and
a second stress buffer layer between the lower electrode layer and the first stress buffer layer, the second stress buffer layer including a third metal oxide including a third metal that is different from the second metal.
18. The integrated circuit device as claimed in claim 17 , wherein the first stress buffer layer has a rutile-shaped tetragonal crystal structure.
19. The integrated circuit device as claimed in claim 17 , wherein:
the lower electrode layer includes the same material as the upper electrode layer, and
the first metal oxide includes titanium oxide, ruthenium oxide, chromium oxide, or nickel oxide, and the second metal oxide includes hafnium oxide, or zirconium oxide.