IP Library › Granted Patent US 11,848,349
Granted Patent B1
US 11,848,349 · App. 16/389,238 · Granted Dec 19, 2023

Curved semiconductor and method of forming the same

Inventors: Andrew C. Keefe (Encino, CA); Geoffrey P. McKnight (Los Angeles, CA); Alexander R. Gurga (Canoga Park, CA); Ryan Freeman (Los Angeles, CA)
Assignee: HRL LABORATORIES, LLC
H01L27/14683H01L27/14607H01L27/14806
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Quick Facts
Patent No.
US 11,848,349
App. No.
16/389,238
Granted
Dec 19, 2023
Kind
B1
Abstract

A method of forming a curved semiconductor includes: forming a device layer on a semiconductor substrate; forming a metal layer on the device layer; removing the semiconductor substrate from the device layer; and curving the device layer and the metal layer.

Claims (19)

1. A curved semiconductor comprising:

a curved semiconductor device layer;

a curved metal layer on the semiconductor device layer, the combined device layer and metal layer have a length-to-thickness ratio of about 20 to about 50; and

a package attached to both the semiconductor device layer and the metal layer,

wherein edges of the semiconductor device layer and the metal layer are coplanar,

wherein a first surface of the semiconductor device layer contacts a second surface of the metal layer,

wherein the second surface of the metal layer and a first surface of the metal layer, opposite to the second surface, are curved, and

wherein the first surface of the metal layer is attached to the package such that the metal layer is between the semiconductor device layer and the package.

2. The curved semiconductor of claim 1 , wherein the metal layer comprises copper.

3. The curved semiconductor of claim 1 , wherein the semiconductor device layer has a side edge length of greater than or equal to about 3 cm.

4. The curved semiconductor of claim 1 , wherein an overall thickness of a semiconductor material in the curved semiconductor is in a range of about 2 microns to about 20 microns.

5. The curved semiconductor of claim 1 , wherein the metal layer has a thickness of about 50 microns or greater.

6. The curved semiconductor of claim 1 , wherein the semiconductor device layer comprises an imaging sensor.

7. The curved semiconductor of claim 1 , wherein the metal layer is thicker than the semiconductor device layer.

8. The curved semiconductor of claim 1 , wherein a second surface of the semiconductor device layer, opposite to the first surface of the semiconductor device layer opposite, is concavely curved.

9. The curved semiconductor of claim 1 , wherein the metal layer is continuous on the semiconductor device layer.

10. The curved semiconductor of claim 1 , wherein the package comprises metal, glass, or a semiconductor.

11. The curved semiconductor of claim 10 , wherein the metal layer is attached to the package by glue, solder, or a mechanical fastener.

12. The curved semiconductor of claim 1 , wherein the metal layer is deposited onto the semiconductor layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2019
From: KEEFE, ANDREW C.; MCKNIGHT, GEOFFREY P.; GURGA, ALEXANDER R.; FREEMAN, RYAN
To: HRL LABORATORIES, LLC
Reel/Frame 049186/0668 →
Continuity (1)
Provisional Application 62688143 · Jun 21, 2018
Cited By (1)
US 12,425,739