Three dimensional semiconductor device with memory stack
A device includes a first transistor over a substrate, a second transistor disposed over the first transistor, and a memory element disposed over the second transistor. The second transistor includes a channel layer, a gate dielectric layer surrounding a sidewall of the channel layer, and a gate electrode surrounding a sidewall of the gate dielectric layer.
1. A semiconductor device comprising:
a first transistor disposed over a substrate;
a conductive line disposed over the first transistor;
a memory cell disposed over the conductive line, the memory cell including:
a second transistor, wherein the second transistor comprises:
a channel layer;
a gate dielectric layer surrounding a sidewall of the channel layer; and
a gate electrode surrounding a sidewall of the gate dielectric layer; and
a memory element disposed over the second transistor, wherein the second transistor is vertically interjacent the conductive line and the memory element, and wherein the memory element is vertically interjacent the second transistor and a bit line of the memory cell.
2. The semiconductor device of claim 1 , wherein the channel layer has a pillar shape.
3. The semiconductor device of claim 1 , wherein the channel layer has a ring shape in a plan view.
4. The semiconductor device of claim 3 , wherein the channel layer surrounds a sidewall of an insulating layer in the plan view.
5. The semiconductor device of claim 1 , wherein the second transistor further comprises a first electrode and a second electrode separated by the channel layer.
6. The semiconductor device of claim 5 , wherein the first electrode has been disposed below the channel layer and comprises a conductive line extending along a first direction.
7. The semiconductor device of claim 5 , wherein the first electrode has been disposed below the channel layer and has a sidewall aligned with a sidewall of the channel layer.
8. The semiconductor device of claim 7 , wherein each of the first electrode and the second electrode comprise a metal material or a doped semiconductor material.
9. The semiconductor device of claim 5 , wherein the second electrode has a portion that has been over the gate dielectric layer and has a sidewall aligned with a sidewall of the memory element.
10. The semiconductor device of claim 1 , wherein the channel layer comprises IGO, ZnO, IGZO, IWO, or a combination thereof.
11. The semiconductor device of claim 1 , wherein the channel layer comprises polysilicon, Ge, SiGe, or a combination thereof.
12. The semiconductor device of claim 1 , wherein the second transistor further comprises spacers around the gate electrode, and wherein the spacers have a ring shape in a plan view.
13. The semiconductor device of claim 1 , wherein the memory element comprises a resistive material, a phase change material or a magnetic tunnel junction structure.
14. A semiconductor device comprising:
a substrate;
a first transistor array over the substrate;
a first insulating layer covering the first transistor array;
a second transistor array disposed over the first insulating layer, wherein a transistor of the second transistor array comprises:
a first channel layer;
a first gate dielectric layer surrounding a sidewall of the first channel layer; and
a first gate electrode surrounding a sidewall of the first gate dielectric layer; and
a first memory element having a first electrode disposed over and electrically connected to the second transistor; and
a bit line disposed over and electrically connected to a second electrode of the memory element.
15. The semiconductor device of claim 14 , wherein the first transistor array includes a FinFET, a gate-all-around FET, or a planar FET.
16. The semiconductor device of claim 14 , further comprising a third transistor array and second memory elements disposed over the first memory elements, wherein the second memory elements have been electrically connected to the third transistor array.
17. The semiconductor device of claim 16 , wherein the first memory elements and the second memory elements comprise different types of memory.
18. A semiconductor device, comprising:
a first transistor disposed over a substrate;
a second transistor disposed over the first transistor, wherein the second transistor comprises:
a columnar channel layer;
a gate dielectric layer surrounding the columnar channel layer;
a gate electrode layer surrounding the gate dielectric layer; and
a memory element over, vertically overlapping, and contacting the second transistor at a first contact point, the memory element also contacting a bit line at a second contact point, the second contact point being over and vertically overlapping the first contact point.
19. The semiconductor device of claim 18 , wherein the columnar channel layer has a ring shape in a plan view.
20. The semiconductor device of claim 18 , wherein the second transistor further comprises a first electrode and a second electrode above the first electrode, the first electrode and the second electrode being separated by the columnar channel layer.