IP Library Granted Patent US 11,993,009
Granted Patent B2
US 11,993,009 · App. 16/835,370 · Granted May 28, 2024

Compositions for additive manufacturing and methods of additive manufacturing, particularly of nuclear reactor components

Inventors: Benjamin D. Fisher (Lynchburg, VA); John R. Salasin (Lynchburg, VA); Bryan Blake Wiggins (Forest, VA)
Assignee: BWXT Advanced Technologies LLC
B29C64/165B33Y10/00B33Y70/10B33Y80/00C08F2/08C08F2/54C08F20/14C08F22/1006C08K3/08C08K3/10C08K3/14C08K3/16C08K3/22C08K5/0041C08K5/101C08K5/19C08K5/3492C08K5/5397G21C3/04G21C3/50G21C21/00C08K2003/0887C08K2003/221C08K2201/005C08K2201/006
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Quick Facts
Patent No.
US 11,993,009
App. No.
16/835,370
Granted
May 28, 2024
Kind
B2
Abstract

Additive manufacturing methods use a surrogate slurry to iteratively develop an additive manufacturing protocol and then substitutes a final slurry composition to then additively manufacture a final component using the developed additive manufacturing protocol. In the nuclear reactor component context, the final slurry composition is a nuclear fuel slurry having a composition: 30-45 vol. % monomer resin, 30-70 vol. % plurality of particles of uranium-containing material, >0-7 vol. % dispersant, photoactivated dye, photoabsorber, photoinitiator, and 0-18 vol. % (as a balance) diluent. The surrogate slurry has a similar composition, but a plurality of surrogate particles selected to represent a uranium-containing material are substituted for the particles of uranium-containing material. The method provides a means for in-situ monitoring of characteristics of the final component during manufacture as well as in-situ volumetric inspection. Compositions of surrogate slurries and nuclear fuel slurries are also disclosed.

Claims (78)

1. A slurry for additive manufacturing having a composition, comprising (in vol. % relative to total volume of the slurry):

a monomer resin

30 vol. % to 45 vol. %;

a plurality of surrogate particles

30 vol. % to 70 vol. %;

a dispersant

>0 vol. % to 7 vol. %;

a photoactivated dye

greater than 0 vol. %;

a photoabsorber

greater than 0 vol. %;

a photoinitiator

greater than 0 vol. %; and

a diluent

0 vol. % to 18 vol. % as a balance,

wherein the particles have a composition including a uranium-containing material, and

wherein the uranium-containing material is uranium carbide, uranium oxycarbide, uranium nitride, or uranium silicide.

2. The slurry for additive manufacturing according to claim 1 , wherein the plurality of particles has a D50 particle size of 40 nm to 10 μm.

3. The slurry for additive manufacturing according to claim 1 , wherein the monomer resin is an acrylate-based monomer resin or a methacrylate-based monomer or mixtures thereof.

4. The slurry for additive manufacturing as in claim 3 , wherein the monomer resin is at least 50% acrylate-based.

5. The slurry for additive manufacturing as in claim 3 , wherein the monomer resin is 70 to 90% acrylate-based.

6. The slurry for additive manufacturing according to claim 3 , wherein the acrylate-based monomer resin is mono-functional, di-functional, tri-functional or tetra-functional or mixture thereof.

7. The slurry for additive manufacturing according to claim 6 , wherein the acrylate-based monomer resin is at least 50% di-functional.

8. The slurry for additive manufacturing according to claim 7 , wherein the acrylate-based monomer resin is at least 80% di-functional.

9. The slurry for additive manufacturing according to claim 7 , wherein the acrylate-based monomer resin is 70-90% di-functional.

10. The slurry for additive manufacturing according to claim 1 , wherein the photoactivated dye is a triarylmethane dye, the photoabsorber is a triazine-based photoabsorber, and the photoinitiator is a Type I or Type II photoinitiator.

11. The slurry for additive manufacturing according to claim 1 , wherein the diluent is inert.

12. The slurry for additive manufacturing according to claim 1 , wherein the diluent is methylnaphthalene.

13. The slurry for additive manufacturing according to claim 1 , wherein the composition is curable by photoinitiation.

14. The slurry for additive manufacturing according to claim 1 , wherein the photoactivated dye is C 25 H 30 ClN 3 , the photoabsorber is 2-hydroxyphenyl-s-triazine with 18-20% 2-methoxy-1-propyl-acetate, and the photoinitiator is Bis(2,4,6-trimethylbenzoyl)-phenylphosphineoxide.

15. The slurry for additive manufacturing according to claim 1 , wherein the plurality of particles has a D50 particle size of 40 nm to 10 μm,

wherein the monomer resin is an acrylate-based monomer resin or a methacrylate-based monomer or mixtures thereof,

wherein the photoactivated dye is a triarylmethane dye,

wherein the photoabsorber is a triazine-based photoabsorber,

wherein the photoinitiator is a Type I or Type II photoinitiator, and

wherein the diluent is methylnaphthalene.

16. A method for manufacturing a component of a nuclear reactor system, the method comprising:

forming a green body of a component of a nuclear reactor system from the slurry for additive manufacturing according to claim 1 , wherein the forming uses an additive manufacturing protocol.

17. The method according to claim 16 , further comprising sintering the green body to form the component of the nuclear reactor system.

18. A slurry for additive manufacturing having a composition, comprising (in vol. % relative to total volume of the slurry):

a monomer resin

30 vol. % to 45 vol. %;

a plurality of particles

30 vol. % to 70 vol. %;

a dispersant

>0 vol. % to 7 vol. %;

a photoactivated dye

greater than 0 vol. %;

a photoabsorber

greater than 0 vol. %;

a photoinitiator

greater than 0 vol. %; and

a diluent

0 vol. % to 18 vol. % as a balance,

wherein the particles have a composition including a uranium-containing material, and

wherein the uranium-containing material is a cermet of uranium oxide and tungsten, a cermet of uranium dioxide and tungsten, a cermet of uranium oxide and molybdenum, or a cermet of uranium dioxide and molybdenum.

19. The slurry for additive manufacturing according to claim 18 , wherein the plurality of particles has a D50 particle size of 40 nm to 10 μm.

20. The slurry for additive manufacturing according to claim 18 , wherein the monomer resin is an acrylate-based monomer resin or a methacrylate-based monomer or mixtures thereof.

21. The slurry for additive manufacturing as in claim 20 , wherein the monomer resin is at least 50% acrylate-based.

22. The slurry for additive manufacturing as in claim 20 , wherein the monomer resin is 70 to 90% acrylate-based.

23. The slurry for additive manufacturing according to claim 20 , wherein the acrylate-based monomer resin is mono-functional, di-functional, tri-functional or tetra-functional or mixture thereof.

24. The slurry for additive manufacturing according to claim 23 , wherein the acrylate-based monomer resin is at least 50% di-functional.

25. The slurry for additive manufacturing according to claim 24 , wherein the acrylate-based monomer resin is at least 80% di-functional.

26. The slurry for additive manufacturing according to claim 24 , wherein the acrylate-based monomer resin is 70-90% di-functional.

27. The slurry for additive manufacturing according to claim 18 , wherein the photoactivated dye is a triarylmethane dye, the photoabsorber is a triazine-based photoabsorber, and the photoinitiator is a Type I or Type II photoinitiator.

28. The slurry for additive manufacturing according to claim 18 , wherein the diluent is inert.

29. The slurry for additive manufacturing according to claim 18 , wherein the diluent is methylnaphthalene.

30. The slurry for additive manufacturing according to claim 18 , wherein the composition is curable by photoinitiation.

31. The slurry for additive manufacturing according to claim 18 , wherein the photoactivated dye is C 25 H 30 ClN 3 , the photoabsorber is 2-hydroxyphenyl-s-triazine with 18-20% 2-methoxy-1-propyl-acetate, and the photoinitiator is Bis(2,4,6-trimethylbenzoyl)-phenylphosphineoxide.

32. The slurry for additive manufacturing according to claim 18 , wherein the plurality of particles has a D50 particle size of 40 nm to 10 μm,

wherein the monomer resin is an acrylate-based monomer resin or a methacrylate-based monomer or mixtures thereof,

wherein the photoactivated dye is a triarylmethane dye,

wherein the photoabsorber is a triazine-based photoabsorber,

wherein the photoinitiator is a Type I or Type II photoinitiator, and

wherein the diluent is methylnaphthalene.

33. A method for manufacturing a component of a nuclear reactor system, the method comprising:

forming a green body of a component of a nuclear reactor system from the slurry for additive manufacturing according to claim 18 , wherein the forming uses an additive manufacturing protocol.

34. The method according to claim 33 , further comprising sintering the green body to form the component of the nuclear reactor system.

Assignments (2)
SECURITY INTEREST Recorded Nov 10, 2025
From: BWXT ADVANCED TECHNOLOGIES LLC; BWXT ISOTOPE TECHNOLOGY GROUP, INC.; BWXT NUCLEAR ENERGY, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 073531/0358 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 18, 2024
From: FISHER, BENJAMIN D.; SALASIN, JOHN R.; WIGGINS, BRYAN BLAKE
To: BWXT ADVANCED TECHNOLOGIES LLC
Reel/Frame 066806/0661 →
Continuity (2)
Provisional Application 62827670 · Apr 1, 2019
Related Publication 20200353681A1 · Nov 12, 2020