IP Library › Granted Patent US 12,072,543
Granted Patent B1
US 12,072,543 · App. 18/060,145 · Granted Aug 27, 2024

Simultaneous edge blackening and light recycling in optical waveguide displays

Inventor: Pasqual Rivera (Woodinville, WA)
Assignee: META PLATFORMS TECHNOLOGIES, LLC
G02B6/4295G02B6/0083G02B27/0172H01L31/054H01L31/18
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,072,543
App. No.
18/060,145
Granted
Aug 27, 2024
Kind
B1
Abstract

A waveguide display includes a waveguide configured to transport display light visible to human eyes, a coupler formed on a broadside surface of the waveguide and configured to couple portions of the display light out of the waveguide at one or more regions of the waveguide, and a photovoltaic device at an edge of the waveguide, the photovoltaic device configured to convert at least a portion of the display light that reaches the edge of the waveguide into electrical power.

Claims (34)

1. A waveguide display comprising:

a waveguide configured to transport display light visible to human eyes;

a coupler formed on a broadside surface of the waveguide and configured to couple portions of the display light out of the waveguide at one or more regions of the waveguide; and

a photovoltaic device at an edge of the waveguide, the photovoltaic device configured to convert at least a portion of the display light that reaches the edge of the waveguide into electrical power.

2. The waveguide display of claim 1 , wherein the photovoltaic device includes a p-type layer and an n-type layer, and wherein at least one of the p-type layer, the n-type layer, or both are formed in the waveguide.

3. The waveguide display of claim 2 , wherein the p-type layer and the n-type layer are implanted in the waveguide and are at different depths from the broadside surface of the waveguide.

4. The waveguide display of claim 2 , wherein the p-type layer and the n-type layer are implanted in the waveguide and are at different depths from a sidewall surface of the waveguide.

5. The waveguide display of claim 2 , wherein the waveguide is p-doped and a surface layer of the waveguide is n-doped.

6. The waveguide display of claim 2 , wherein the waveguide is n-doped and a surface layer of the waveguide is p-doped.

7. The waveguide display of claim 2 , wherein dopants in the n-type layer include N, P, As, Ti, Cr, V, or a combination thereof, and wherein dopants in the p-type layer include B, Al, Ga, Ge, V, or a combination thereof.

8. The waveguide display of claim 1 , wherein the photovoltaic device includes a p-type region and an n-type region, and wherein the p-type region and the n-type region are formed in the waveguide and are at different regions of the broadside surface of the waveguide.

9. The waveguide display of claim 1 , wherein the photovoltaic device includes a p-type layer and an n-type layer, and wherein at least one of the p-type layer, the n-type layer, or both are deposited on the broadside surface or sidewalls of the waveguide.

10. The waveguide display of claim 1 , wherein the photovoltaic device includes a thin-film photovoltaic cell, the thin-film photovoltaic cell including a plurality of thin-film layers deposited on the broadside surface or sidewalls of the waveguide.

11. The waveguide display of claim 10 , wherein the plurality of thin-film layers includes an amorphous silicon carbide layer, a crystalline silicon layer, a cadmium telluride (CdTe) layer, a copper indium gallium selenide (CIGS) layer, a copper indium selenide (CIS) layer, a perovskite material layer, a dye-sensitized organic material layer, a quantum dots material layer, or a combination thereof.

12. The waveguide display of claim 1 , wherein the waveguide is characterized by a refractive index greater than 2.0.

13. The waveguide display of claim 1 , wherein the waveguide includes a substrate of SiC, LiNbO 3 , rutile, zinc sulfide, or zinc selenide.

14. The waveguide display of claim 1 , further comprising two electrodes, the two electrodes including a metal electrode, a transparent conductive oxide electrode, or both.

15. The waveguide display of claim 1 , wherein the photovoltaic device includes a tandem photovoltaic cell, a multijunction photovoltaic cell, or a stacked photovoltaic cell including photovoltaic cells having peak absorption at different wavelengths.

16. The waveguide display of claim 1 , further comprising a gate dielectric layer.

17. The waveguide display of claim 1 , further comprising a rechargeable battery or an electrical circuit connected to the photovoltaic device.

18. A near-eye display system comprising:

a frame;

one or more projectors configured to generate display light for displaying an image to a user's eye;

a waveguide coupled to the frame and configured to transport the display light;

one or more couplers configured to coupler the display light from the one or more projectors into the waveguide;

an output coupler formed on a broadside surface of the waveguide and configured to couple portions of the display light out of the waveguide at one or more regions of the waveguide; and

a photovoltaic device at an edge of the waveguide and electrically coupled to the frame, the photovoltaic device configured to convert at least a portion of the display light that reaches the edge of the waveguide into electrical power.

19. A method comprising:

forming one or more optical couplers on a broadside surface of a waveguide;

forming a photovoltaic device at an edge of the waveguide; and

coupling the waveguide to a frame of a near-eye display, the coupling including electrically coupling the photovoltaic device to an electrical device on the frame.

20. The method of claim 19 , wherein forming the photovoltaic device at the edge of the waveguide comprises:

implanting p-type dopants into the waveguide at a first implant depth range from the broadside surface or a sidewall surface of the waveguide; and

implanting n-type dopants into the waveguide at a second implant depth range from the broadside surface or the sidewall surface of the waveguide, the second implant depth range different from the first implant depth range.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 24, 2023
From: RIVERA, PASQUAL
To: META PLATFORMS TECHNOLOGIES, LLC
Reel/Frame 062474/0379 →
Continuity (1)
Provisional Application 63284152 · Nov 30, 2021
Cited By (1)
US 12,619,004