IP Library Granted Patent US 12,281,187
Granted Patent B2
US 12,281,187 · App. 17/624,050 · Granted Apr 22, 2025

Microwell film for bioassay, photosensitive resin composition for formation of the microwell film for bioassay, and method of manufacturing the microwell film for bioassay

Inventors: Fujito Yamaguchi (Tokyo, JP); Ryuichi Ito (Tokyo, JP); Makoto Okada (Tokyo, JP)
Assignee: ASAHI KASEI KABUSHIKI KAISHA
C08F220/24C08F290/067C08J5/18C09D4/06G03F7/027B32B27/30B32B27/40C08J2325/06C08J2345/00C08J2367/02C08J2369/00C08J2383/04C12M1/00
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Quick Facts
Patent No.
US 12,281,187
App. No.
17/624,050
Granted
Apr 22, 2025
Kind
B2
Abstract

To provide microwell films for bioassay suitable for a “unimolecular enzyme assay” method and methods of manufacturing the films, a microwell film for bioassay is comprised of at least a substrate ( 11 ), and a resin layer ( 12 ) having microwells on its surface provided on one main surface of the substrate ( 11 ), where in the substrate ( 11 ) and the resin forming the resin layer ( 12 ), an absorption coefficient at each of wavelengths of 350 nm to 800 nm is 0.01 μm −1 or less.

Claims (67)

1. A microwell film for bioassay, comprising:

at least a substrate; and

a resin layer having microwells on a surface thereof provided on one main surface of the substrate,

wherein in the substrate and the resin layer, an absorption coefficient at each of wavelengths of 350 nm to 800 nm is 0.01 μm −1 or less.

2. The microwell film for bioassay according to claim 1 , wherein an absorption coefficient of the resin layer at a wavelength of 300 nm is 0.02 μm −1 or less, and is a maximum value among respective absorption coefficients at wavelengths of 300 nm to 800 nm.

3. The microwell film for bioassay according to claim 1 , wherein the substrate and the resin layer contain nitrogen elements, an average nitrogen element concentration (Nf) of the resin layer is higher than an average nitrogen element concentration (Ns) of the substrate, and the substrate has a region with a nitrogen element concentration (Ni) meeting the following equation (1) on a first main surface side provided with the resin layer,

Nf>Ni>Ns   Equation(1).

4. The microwell film for bioassay according to claim 1 , wherein the resin layer is a cured material of a photosensitive resin composition derived from at least a photopolymerizable monomer and at least a photopolymerizable oligomer.

5. The microwell film for bioassay according to claim 4 , wherein the resin layer is a cured material of a photosensitive resin composition containing at least a nitrogen-containing photopolymerizable monomer.

6. The microwell film for bioassay according to claim 1 , wherein the substrate is polyethylene terephthalate, polycarbonate, cycloolefin polymer, polydimethylsiloxane or polystyrene.

7. The microwell film for bioassay according to claim 1 , wherein in the resin layer, a ratio between a fluorine element concentration (Fs) of a surface of the resin layer and an average fluorine element concentration (Fb) in the resin layer meets the following equation (2,

1< Fs<Fb≤ 1500  Equation(2).

8. A photosensitive resin composition for formation of a microwell film for bioassay, comprising:

(A) photopolymerizable monomer;

(B) photopolymerizable oligomer; and

(C) photopolymerization initiator,

wherein a content of the (A) photopolymerizable monomer is 10 to 80 percent by weight relative to weight of the photosensitive resin composition,

a content of the (B) photopolymerizable oligomer is 10 to 80 percent by weight relative to the weight of the photosensitive resin composition,

a content of the (C) photopolymerization initiator is 0.5 to 10.0 percent by weight relative to the weight of the photosensitive resin composition, and

an absorption coefficient at each of wavelengths of 350 nm to 800 nm after curing is 0.01 μm −1 or less.

9. The photosensitive resin composition for formation of the microwell film for bioassay according to claim 8 , wherein the (C) photopolymerization initiator is an α-hydroxyalkyl phenon-based polymerization initiator.

10. The photosensitive resin composition for formation of the microwell film for bioassay according to claim 8 , wherein the (A) photopolymerizable monomer contains a nitrogen-containing photopolymerizable monomer.

11. The photosensitive resin composition for formation of the microwell film for bioassay according to claim 8 , wherein the (A) photopolymerizable monomer contains a fluorine-containing (meth)acrylate expressed by the following chemical formula (1),

in the chemical formula (1), R1 represents the following chemical formula (2), and R2 represents the following chemical formula (3),

in the chemical formula (2), n is an integer ranging from “1” to “6”,

in the chemical formula (3), R represents H or CH 3 .

12. A method of manufacturing the microwell film for bioassay according to claim 1 , comprising the steps of:

applying onto at least a predetermined substrate or a master mold a photosensitive resin composition for formation of the microwell film for bioassay comprising:

(A) photopolymerizable monomer;

(B) photopolymerizable oligomer; and

(C) photopolymerization initiator,

wherein a content of the (A) photopolymerizable monomer is 10 to 80 percent by weight relative to weight of the photosensitive resin composition,

a content of the (B) photopolymerizable oligomer is 10 to 80 percent by weight relative to the weight of the photosensitive resin composition,

a content of the (C) photopolymerization initiator is 0.5 to 10.0 percent by weight relative to the weight of the photosensitive resin composition, and

an absorption coefficient at each of wavelengths of 350 nm to 800 nm after curing is 0.01 μm− or less;

pressing the photosensitive resin composition between the substrate and the master mold;

curing the photosensitive resin composition by exposure to light to obtain a cured material; and

peeling off the cured material from the master mold.

13. A method of manufacturing the microwell film for bioassay according to claim 3 , comprising:

applying onto at least a predetermined substrate a photosensitive resin composition for formation of the microwell film for bioassay, comprising:

(A) photopolymerizable monomer;

(B) photopolymerizable oligomer; and

(C) photopolymerization initiator,

wherein a content of the (A) photopolymerizable monomer is 10 to 80 percent by weight relative to weight of the photosensitive resin composition,

a content of the (B) photopolymerizable oligomer is 10 to 80 percent by weight relative to the weight of the photosensitive resin composition,

a content of the (C) photopolymerization initiator is 0.5 to 10.0 percent by weight relative to the weight of the photosensitive resin composition, and

an absorption coefficient at each of wavelengths of 350 nm to 800 nm after curing is 0.01 μm −1 or less, wherein the (A) photopolymerizable monomer contains a nitrogen-containing photopolymerizable monomer,

leaving the substrate with the photosensitive composition applied thereon for a predetermined time after applying the photosensitive composition onto the substrate;

pressing the photosensitive resin composition between the substrate and a master mold;

curing the photosensitive resin composition by exposure to light to obtain a cured material; and

peeling off the cured material from the master mold.

14. A method of manufacturing the microwell film for bioassay according to claim 7 , comprising the steps of:

applying onto at least a predetermined substrate or a master mold a photosensitive resin composition for formation of the microwell film for bioassay comprising:

(A) photopolymerizable monomer;

(B) photopolymerizable oligomer; and

(C) photopolymerization initiator,

wherein a content of the (A) photopolymerizable monomer is 10 to 80 percent by weight relative to weight of the photosensitive resin composition,

a content of the (B) photopolymerizable oligomer is 10 to 80 percent by weight relative to the weight of the photosensitive resin composition,

a content of the (C) photopolymerization initiator is 0.5 to 10.0 percent by weight relative to the weight of the photosensitive resin composition, and

an absorption coefficient at each of wavelengths of 350 nm to 800 nm after curing is 0.01 μm −1 or less, wherein the (A) photopolymerizable monomer contains a fluorine-containing (meth)acrylate expressed by the following chemical formula (1),

in the chemical formula (1), R1 represents the following chemical formula (2), and R2 represents the following chemical formula (3),

in the chemical formula (2), n is an integer ranging from “1” to “6”,

in the chemical formula (3), R represents H or CH 3 ;

pressing the photosensitive resin composition between the substrate and the master mold;

curing the photosensitive resin composition by exposure to light to obtain a cured material; and

peeling off the cured material from the master mold.

15. The microwell film for bioassay according to claim 1 which is suitable for use in a unimolecular enzyme assay method.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 30, 2021
From: YAMAGUCHI, FUJITO; ITO, RYUICHI; OKADA, MAKOTO
To: ASAHI KASEI KABUSHIKI KAISHA
Reel/Frame 058510/0849 →
Priority Claims (1)
JP 2019-123981 · Jul 2, 2019 · national
Continuity (1)
Related Publication 20220340700A1 · Oct 27, 2022
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