IP Library › Granted Patent US 12,313,568
Granted Patent B1
US 12,313,568 · App. 18/815,092 · Granted May 27, 2025

Light reflection support and through hole inspection system

Inventors: Sung Soo Park (Yongin-si, KR); Hyun Jin Tak (Sejong-si, KR); Dong Kook Bae (Hwaseong-si, KR); Hyeon Gu Kim (Hwaseong-si, KR); Jang Won Shin (Incheon, KR); Jin Hwan Bae (Osan-si, KR)
Assignees: JOONGWOO M-TECH CO., LTD.; AKC CO., LTD.
G01N21/954G01B11/12G01N21/8806G01N21/8851G01B2210/42
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Quick Facts
Patent No.
US 12,313,568
App. No.
18/815,092
Granted
May 27, 2025
Kind
B1
Abstract

An embodiment provides a light reflection support and a through hole inspection system including the same, wherein the light reflection support stably fixes and supports a glass substrate, an inspection target, and reflects illumination light to a lower part of a glass substrate arranged on the opposite side of an imaging part to increase inspection precision from a clear imaged image of a through hole. The light reflection support is used in a device that images a through hole formed in a substrate and inspects whether the through hole is normal from the imaged image, and includes a transparent support part and a reflection layer part. The transparent support part supports the substrate and has a suction hole that extends to a solid area of the substrate where the through hole is not formed.

Claims (24)

1. A light reflection support used in a device for imaging an image of a through hole formed in a substrate and inspecting whether the through hole is normal from the image, the light reflection support comprising:

a transparent support part configured to support a lower surface of the substrate and has a suction hole that extends from a lower surface of the transparent support part to an upper surface of the transparent support part, the suction hole being configured to extend to a solid area of the substrate where no through hole of the substrate is defined; and

a reflection layer part arranged on the lower surface of the transparent support part to be spaced apart from the substrate, the reflection layer part being configured to reflect light incident from a side of the substrate that is opposite to the lower surface of the substrate,

wherein the reflection layer part is a film coated on the lower surface of the transparent support part, such that the suction hole has a penetration structure without blockage.

2. The light reflection support of claim 1 ,

wherein a thickness of the transparent support part is 2 mm or less.

3. A through hole inspection system for imaging an image of a through hole formed in a substrate and inspecting whether the through hole is normal from the image, the through hole inspection system comprising:

a light source configured to irradiate light to the substrate;

an imaging configured to image the substrate;

a light reflection support having:

a transparent support part configured to support a lower surface of the substrate, the transparent support part having a suction hole extending from a lower surface of the transparent support part to an upper surface of the transparent support part, the transparent support part being configured to extend to a solid area of the substrate where the no through hole of the substrate is defined; and

a reflection layer part arranged on the lower surface of the transparent support part to be spaced apart from the substrate, the reflection layer part being configured to reflect the light irradiated from the light source; and

a controller configured to calculate a size of the through hole from an image acquired from the imaging part,

wherein the reflection layer part is a film coated on the lower surface of the transparent support part, such that the suction hole has a penetration structure without blockage.

4. The through hole inspection system of claim 3 , further comprising:

a porous stage configured to support the light reflection support and allow negative pressure provided from a negative pressure generation part to be transmitted to the suction hole.

5. The through hole inspection system of claim 3 , further comprising:

a focus transfer part configured to move a focus of the imaging part in a thickness direction of the substrate.

6. The through hole inspection system of claim 5 ,

wherein the through hole has an upper part diameter defined on an upper surface of the substrate, a lower part diameter defined on a lower surface of the substrate, and a waist diameter defined in a center in the thickness direction of the substrate, the waist diameter having a size smaller than a size of the upper part diameter and the lower part diameter.

7. The through hole inspection system of claim 6 ,

wherein the controller is configured to calculate the size of the upper part diameter from a first image imaged while maintaining the focus of the imaging part at a same height as the upper part diameter, calculate the size of the waist diameter from a second image imaged while maintaining the focus of the imaging part at a same height as the waist diameter, and calculate the size of the lower part diameter from a third image imaged while maintaining the focus of the imaging part at a same height as the lower part diameter.

8. The through hole inspection system of claim 3 ,

wherein a thickness of the transparent support part is 2 mm or less.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 15, 2025
From: JOONGWOO M-TECH CO.,LTD.
To: JWMT INC.
Reel/Frame 070837/0222 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2025
From: JOONGWOO NARA CO.,LTD.
To: JOONGWOO M-TECH CO., LTD.
Reel/Frame 069979/0539 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2024
From: PARK, SUNG SOO; TAK, HYUN JIN; BAE, DONG KOOK; KIM, HYEON GU; SHIN, JANG WON; BAE, JIN HWAN
To: JOONGWOO NARA CO.,LTD.; AKC CO.,LTD.
Reel/Frame 068398/0323 →
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