Apparatus for producing a waveform
Bias supplies, plasma processing systems, and associated methods are disclosed. One bias supply comprises a first inductor coupled between a first node of a switch and an output node where a first node of a second inductor is coupled to one of the output node or the first node of the switch. A voltage source is coupled between a second node of the switch and a second node of the second inductor. A connection is made between the return node and one of the second node of the switch and the second node of the second inductor. The bias supply also comprises a controller configured to cause an application of the periodic voltage between the output node and the return node by repeatedly closing the switch so current through the switch completes a full cycle.
1. An apparatus to produce a waveform, the apparatus comprising:
a first node;
a switched path that couples a second node to the first node, and responsive to the switched path being closed, a pulse is initiated at the first node; and
a power supply coupled to the first node, the power supply configured to produce, after the switched path is open, a ramped voltage at the first node;
control circuitry to:
repeatedly close and open the switched path to produce pulses; and
adjust current to the first node by varying a non-zero repetition rate of the closing and opening of the switched path.
2. The apparatus of claim 1 , wherein the control circuitry is configured to repeatedly close the switched path for a time for current through the switched path to complete a full cycle from zero to a peak value, back to zero, to a peak value in an opposite direction and back to zero.
3. The apparatus of claim 1 , wherein the control circuitry is configured to regulate current to the first node by both, varying a voltage of the power supply and the repetition rate of the closing and opening of the switched path.
4. The apparatus of claim 1 , wherein the second node is coupled to the first node via an inductor when the switched path is closed.
5. The apparatus of claim 1 , wherein the power supply is coupled to the first node while the switched path is closed.
6. The apparatus of claim 1 , wherein the second node is configured to couple to ground.
7. The apparatus of claim 1 , wherein the power supply is coupled to the first node via an inductor.
8. The apparatus of claim 7 , wherein the power supply is controllable to control current provided to the first node to control the ramped voltage at the first node.
9. An apparatus to produce a waveform, the apparatus comprising:
a first node; a switch coupled to the first node and a second node;
a controller configured to close and open the switch to initiate pulses of the waveform; and a power supply coupled to the first node and the second node, the power supply configured to produce a ramp of the waveform between the pulses; wherein the controller is configured to adjust a non-zero repetition rate of switch closures to adjust the ramp of the waveform.
10. The apparatus of claim 9 , wherein the controller is configured to adjust a voltage of the power supply and a repetition rate of the switch closures.
11. The apparatus of claim 9 , wherein the power supply is coupled to the first node via an inductor.
12. The apparatus of claim 9 , wherein the switch is coupled to the first node via an inductor.
13. The apparatus of claim 9 , wherein the controller comprises at least one of a processor or a field programmable gate array and the controller comprises non-transitory computer-readable medium comprising instructions stored thereon, for execution by the processor, or for configuring the field programmable gate array, to control operation of the switch.
14. The apparatus of claim 9 , wherein the controller is configured to repeatedly close the switch for a time for current through the switch to complete a full cycle from zero to a peak value, back to zero, to a peak value in an opposite direction and back to zero.