Continuously variable optical confinement for optical amplifiers
View Patent ↗A semiconductor optical amplifier (SOA) with a variable optical confinement factor I′ along the length of the device is disclosed. At the input end of the SOA, the optical confinement is high as an optical core is adjacent an optical gain layer, resulting in a high-gain region that rapidly increases the optical signal power. In the central portion of the SOA, the optical confinement is continuously reduced as the optical core is tapered away from the optical gain layer, thereby lowering the gain, but increasing the output saturation power. Near the output end of the SOA, the optical confinement factor is held constant, providing a length of additional gain, thereby further increasing the output power. The SOA may optionally include a spot-size converter region to focus the output optical signal.
1. A semiconductor optical amplifier comprising:
a lower cladding layer;
an optical gain layer on the lower cladding layer, the optical gain layer adapted to provide optical gain to an optical signal;
a confinement tuning layer on the optical gain layer;
a core on the confinement tuning layer, the core having a first core thickness; and
an upper cladding layer on the core;
wherein the lower cladding layer, the confinement tuning layer, the core, and the upper cladding layer are adapted to collectively guide the optical signal;
wherein a thickness of the confinement tuning layer in a high-gain region has a first confinement layer thickness, the confinement tuning layer in the high-gain region adapted to produce a first optical confinement factor;
wherein the thickness of the confinement tuning layer in a mid-gain region adjacent the high-gain region is continuously tapered from the first confinement layer thickness to a second confinement layer thickness, the second confinement layer thickness greater than the first confinement layer thickness; and
wherein the thickness of the confinement tuning layer in a high-saturation region adjacent the mid-gain region has the second confinement layer thickness, the confinement tuning layer in the high-saturation region adapted to produce a second optical confinement factor, the second optical confinement factor less than the first confinement factor.
2. The semiconductor optical amplifier of claim 1 , wherein the optical gain layer includes one of bulk material or multiple quantum wells.
3. The semiconductor optical amplifier of claim 2 , wherein the bulk material or multiple quantum wells include at least one of InGaAsP, InGaAs, AlGaAs, InAlGaAs, or GaAs.
4. The semiconductor optical amplifier of claim 1 , wherein each of the lower cladding layer, the confinement tuning layer, and the upper cladding layer includes at least one of InP, GaAs, AlGaAs, or InGaP.
5. The semiconductor optical amplifier of claim 1 , wherein the core includes at least one of InGaAsP, InGaAs, AlGaAs, GaAs, or InAlGaAs.
6. The semiconductor optical amplifier of claim 1 , wherein the first core thickness is between approximately 500 Å and approximately 5,000 Å.
7. The semiconductor optical amplifier of claim 1 , wherein the first confinement layer thickness is between approximately 100 Å and approximately 500 Å.
8. The semiconductor optical amplifier of claim 1 , wherein the second confinement layer thickness is between approximately 1,000 Å and approximately 5,000 Å.
9. The semiconductor optical amplifier of claim 1 , wherein the high-gain region has a length between approximately 10 μm and approximately 500 μm.
10. The semiconductor optical amplifier of claim 1 , wherein the mid-gain region has a length between approximately 200 μm and approximately 5,000 μm.
11. The semiconductor optical amplifier of claim 1 , wherein the high-saturation region has a length between approximately 1,000 μm and approximately 10,000 μm.
12. The semiconductor optical amplifier of claim 1 ,
wherein the first optical confinement factor is between approximately 2% and approximately 15%; and
wherein the second optical confinement factor is between approximately 0.1% and approximately 2.0%.
13. The semiconductor optical amplifier of claim 1 , wherein a thickness of each of the lower cladding layer and the upper cladding layer is between approximately 1.5 μm and approximately 2.0 μm.
14. The semiconductor optical amplifier of claim 1 further comprising a substrate, the lower cladding layer on the substrate, the substrate including at least one of InP or GaAs.
15. The semiconductor optical amplifier of claim 1 , wherein the core thickness in a spot-size converter region adjacent the high-saturation region is continuously tapered from the first core thickness to a second core thickness, the second core thickness less than the first core thickness.
16. The semiconductor optical amplifier of claim 15 , wherein the second core thickness is between approximately 0 Å and approximately 300 Å.
17. The semiconductor optical amplifier of claim 15 , wherein the spot-size converter region has a length between approximately 100 μm and approximately 500 μm.
18. The semiconductor optical amplifier of claim 15 , wherein a portion of the optical gain layer in the spot-size converter region adjacent the high-saturation region is intermixed such that the portion of the optical gain layer in the spot-size converter region is substantially transparent to the optical signal.
19. The semiconductor optical amplifier of claim 1 further comprising two electrical contacts, the electrical contacts adapted to apply a bias across the optical gain layer.
20. The semiconductor optical amplifier of claim 19 , wherein each of the two electrical contacts includes at least one of Ti, Pt, Au, Ge, Ni, or Be.