Granted Patent B2

US 12,378,655 · App. 18/407,349 · Granted Aug 5, 2025

Inventors: Daewon Baek (Yongin-si, KR); Minji Jang (Yongin-si, KR); Jongbum Kim (Yongin-si, KR)

Assignee: Samsung Display Co., Ltd.

C23C14/042B05C21/005H10K71/00H10K59/88

Abstract

Claims (11)

1. A mask assembly comprising:

a mask frame including an opening; and

a mask on the mask frame and including a plurality of deposition pattern portions arranged along a first direction and a dummy pattern portion, wherein a deposition pattern portion from among the plurality of deposition pattern portions overlaps the opening, and the dummy pattern portion is outside the deposition pattern portion,

wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio, and is arranged between two adjacent deposition pattern portions from among the plurality of deposition pattern portions,

wherein the dummy pattern portion includes a plurality of dummy holes,

wherein the deposition pattern portions include a first deposition hole and a second deposition hole having different planar shapes from each other, and the second deposition hole is adjacent to one of the plurality of dummy holes of the dummy pattern portion in the first direction, and

wherein the second deposition hole has a shape corresponding to a shape of one of the plurality of dummy holes such that a width between the second deposition hole and the one of the plurality of dummy holes is constant in a plan view.

2. The mask assembly of claim 1 , wherein

the plurality of dummy holes have shapes different from those of the first deposition hole and the second deposition hole in a plan view.

3. The mask assembly of claim 1 , wherein the dummy pattern portion entirely surrounds the deposition pattern portion in a plan view.

4. The mask assembly of claim 1 , wherein the dummy pattern portion partially surrounds the deposition pattern portion in a plan view.

Priority Claims (1)

Continuity (2)

References Cited (17)