Graphene vapor deposition system and process
View Patent ↗A graphene vapor deposition system and process are disclosed. The system includes a support for a copper-plated sheet, a housing defining an interior region, a hydraulic cylinder to move the housing between a first and a second position, a pump to evacuate the interior region, carbon powder within the interior region, and a heat source to vaporize the carbon powder, for causing graphene vapor deposition on the copper. The process includes dissolving the copper and recovering the graphene.
1. A graphene vapor deposition system ( 10 ) comprising:
an electroplating tank ( 156 );
a supporting surface ( 14 ) for supporting a copper-plated sheet of metal ( 12 ) adjacent to the electroplating tank ( 156 );
at least one housing ( 20 ) defining an interior region ( 120 ), wherein the at least one housing ( 20 ) includes a sealing surface ( 22 ) that is capable when urged against the supporting surface ( 14 ) of maintaining predetermined vacuum conditions within the interior region ( 120 ) of the at least one housing ( 20 );
a hydraulic cylinder means ( 28 ) operatively coupled to the at least one housing ( 20 ) for moving the at least one housing ( 20 ) between a first position above the supporting surface ( 14 ) and a second position to urge the sealing surface against the supporting surface and provide a vacuum-tight seal therebetween;
a pump ( 24 ) to evacuate the interior region ( 120 ) to the predetermined vacuum conditions when the sealing surface is urged against the supporting surface;
a predetermined amount of carbon disposed in the interior region;
a primary heating means ( 16 ) powered by a source to heat the interior region ( 120 );
a secondary heating means ( 26 ) powered by the source to convert the carbon to vaporized carbon, for enabling graphene vapor deposition on the copper; and
a dissolving tank ( 132 ) adjacent to the housing ( 20 ).
2. The graphene vapor deposition system ( 10 ) of claim 1 , including a control system ( 111 ) operatively connected to the pump ( 24 ) and the primary heating means, for controllably enabling graphene vapor deposition on the copper.
3. The graphene vapor deposition system ( 10 ) of claim 1 , wherein at least one of the dissolving tank ( 132 ) and the electroplating tank ( 156 ) are mobile, and further comprising a mobile plate holding table ( 130 ) operative to move the copper-plated sheet ( 12 ) from a first plate position to a second plate position.
4. The graphene vapor deposition system ( 10 ) of claim 3 , further comprising a mobile robotic arm ( 152 ) operative to transfer a metal sheet ( 12 ) to and from the supporting surface ( 214 ).
5. The graphene vapor deposition system ( 10 ) of claim 4 , wherein the mobile robotic arm ( 152 ) is operative to transfer a sheet of metal ( 12 A) into the electroplating tank ( 156 ), to transfer the copper-plated sheet ( 12 ) to the supporting surface ( 14 ), and to transfer the copper-plated sheet ( 12 ) into the dissolving tank ( 132 ).
6. The graphene vapor deposition system ( 10 ) of claim 3 , wherein the dissolving tank ( 132 ), the electroplating tank ( 156 ), and the mobile plate holding table ( 130 ) are automated, computer-controlled, and chain driven.
7. The graphene vapor deposition system ( 10 ) of claim 1 , wherein the at least one housing ( 20 ) comprises at least two housings ( 20 ).
8. A graphene vapor deposition process comprising:
transferring a sheet of metal into an electro-plating tank;
electro-plating the sheet to make a copper-plated sheet;
positioning the copper-plated sheet on a surface;
actuating hydraulic cylinder means to cause a vacuum housing defining an interior region to be lowered onto the surface, wherein the copper-plated sheet is disposed within the interior region;
initiating vacuum conditions within the interior region of the vacuum housing;
powering on a primary heating source within the interior region;
once predetermined vacuum conditions and a predetermined temperature by the primary heating source are achieved, activating a secondary heating source to vaporize carbon; and
once the vaporized carbon has coated the copper-plated sheet to form a graphene coated copper-plated sheet, transferring the graphene coated copper-plated sheet into a dissolving tank filled with a copper-dissolving liquid.
9. The graphene vapor deposition process of claim 8 , further including:
once graphene begins to form on the copper of the copper-plated sheet and before transferring the graphene coated copper-plated sheet into the dissolving tank, opening a vacuum release valve and moving the vacuum housing from a first position to a second position, and repeating the steps of actuating, initiating, powering on, and activating, to achieve more efficient graphene coverage on the copper.
10. The graphene vapor deposition process of claim 8 , further including:
once the copper has dissolved, removing the graphene from the dissolving tank.
11. The graphene vapor deposition process of claim 10 , further including:
after removing the graphene from the dissolving tank, storing the removed graphene.
12. The graphene vapor deposition process of claim 8 , further comprising:
once graphene begins to form on the copper of the copper-plated sheet and before transferring the graphene coated copper-plated sheet into the dissolving tank, opening a vacuum release valve, raising the vacuum housing, and moving the copper-plated sheet from a first plate position to a second plate position, and repeating the steps of actuating, initiating, powering on, and activating, to achieve more efficient graphene coverage on the copper.