Leakage reduction for multi-gate devices
View Patent ↗Methods and semiconductor structures are provided. A method according to the present disclosure includes depositing a top epitaxial layer over a substrate, forming a fin structure from the top epitaxial layer and a portion of the substrate, recessing a source/drain region of the fin structure to form a source/drain recess, conformally depositing a semiconductor layer over surfaces of the source/drain recess, etching back the semiconductor layer to form a diffusion stop layer over a bottom surface of the source/drain recess, depositing a first epitaxial layer over the diffusion stop layer and sidewalls source/drain recess, depositing a second epitaxial layer over the first epitaxial layer, and depositing a third epitaxial layer over the second epitaxial layer. A germanium concentration of the diffusion stop layer is greater than a germanium concentration of the top epitaxial layer or a germanium concentration of the first epitaxial layer.
1. A method, comprising:
depositing a top epitaxial layer directly on a top surface a substrate using molecular beam epitaxy (MBE) or vapor phase deposition (VPE);
forming a first fin structure and a second fin structure from the top epitaxial layer and a portion of the substrate such that each of the first fin structure and the second fin structure comprises a lower portion made out of the substrate and an upper portion made of the top epitaxial layer;
depositing a dielectric material over the substrate, the first fin structure and the second fin structure;
etching back the dielectric material to form an isolation feature having a first portion disposed between the first fin structure and the second fin structure and a second portion not disposed between the first fin structure and the second fin structure, a top surface of the first portion being higher than a top surface of the second portion;
recessing source/drain regions of the first fin structure and the second fin structure to form a source/drain recess that extends into and terminates in the top epitaxial layer;
conformally depositing a semiconductor layer over surfaces of the source/drain recess;
etching back the semiconductor layer to form a diffusion stop layer over a bottom surface of the source/drain recess,
depositing a first epitaxial layer over the diffusion stop layer and sidewalls source/drain recess;
depositing a second epitaxial layer over the first epitaxial layer; and
depositing a third epitaxial layer over the second epitaxial layer,
wherein the top epitaxial layer comprises a first germanium concentration, the diffusion stop layer comprises a second germanium concentration and the first epitaxial layer comprises a third germanium concentration,
wherein the second germanium concentration is greater than the first germanium concentration or the third germanium concentration.
2. The method of claim 1 , wherein the depositing of the second epitaxial layer comprises depositing the second epitaxial layer directly on sidewalls of the source/drain recess and the diffusion stop layer.
3. The method of claim 1 , wherein the second germanium concentration is between about 25% and about 35%.
4. The method of claim 3 , wherein a difference between the second germanium concentration and the third germanium concentration is greater than 5%.
5. The method of claim 1 ,
wherein the depositing of the first epitaxial layer comprises in-situ doping the first epitaxial layer with a p-type dopant,
wherein the depositing of the second epitaxial layer comprises in-situ doping the second epitaxial layer with the p-type dopant,
wherein the depositing of the third epitaxial layer comprises in-situ doping the third epitaxial layer with the p-type dopant.
6. The method of claim 5 , wherein the p-type dopant comprises boron (B).
7. The method of claim 5 , wherein the depositing of the semiconductor layer comprises in-situ doping the semiconductor layer with phosphorus (P) or carbon (C).
8. The method of claim 7 , wherein a doping concentration of phosphorus (P) or carbon (C) in the semiconductor layer is between 5×10 18 atoms/cm 3 and about 5×10 20 atoms/cm 3 .
9. A method, comprising:
receiving a workpiece comprising a top epitaxial layer disposed directly on a top surface of a substrate;
forming a first fin structure and a second fin structure from the top epitaxial layer and a portion of the substrate such that each of the first fin structure and the second fin structure comprises a lower portion made out of the substrate and an upper portion made out of the top epitaxial layer;
depositing a dielectric material over the substrate, the first fin structure and the second fin structure;
etching back the dielectric material to form an isolation feature having a first portion disposed between the first fin structure and the second fin structure and a second portion not disposed between the first fin structure and the second fin structure, a top surface of the first portion being higher than a top surface of the second portion;
recessing source/drain regions of the first fin structure and the second fin structure to form a source/drain recess;
depositing a semiconductor layer over sidewalls and a bottom surface of the source/drain recess;
etching back the semiconductor layer to form a diffusion stop layer over a bottom surface of the source/drain recess,
depositing a first epitaxial layer over the diffusion stop layer and sidewalls source/drain recess; and
depositing a second epitaxial layer over the first epitaxial layer such that the second epitaxial layer spans continuously over the first portion of the isolation feature,
wherein the etching back comprises etching a [110] crystalline direction of the semiconductor layer at a first rate and etches a [100] crystalline direction of the semiconductor layer at a second rate smaller than the first rate.
10. The method of claim 9 , wherein the etching back comprises use of hydrogen and hydrogen chloride.
11. The method of claim 9 , wherein the etching back comprises etching the semiconductor layer on the sidewalls of the source/drain recess faster than the semiconductor layer on the bottom surface of the source/drain recess.
12. The method of claim 9 ,
wherein the etching back comprises a process temperature between about 500° C. and about 800° C.,
wherein the etching back comprises a process pressure between about 5 torr and about 350 torr.
13. The method of claim 9 , wherein the source/drain recess extends into the top epitaxial layer but does not extend into the substrate.
14. The method of claim 9 ,
wherein the depositing of the first epitaxial layer comprises in-situ doping the first epitaxial layer with a p-type dopant,
wherein the depositing of the second epitaxial layer comprises in-situ doping the second epitaxial layer with the p-type dopant,
wherein the depositing of the semiconductor layer comprises in-situ doping the semiconductor layer with phosphorus (P) or carbon (C).
15. The method of claim 14 , wherein the p-type dopant comprises boron (B).
16. The method of claim 14 , wherein a doping concentration of phosphorus (P) or carbon (C) in the semiconductor layer is smaller than 5×10 20 atoms/cm 3 .
17. A method, comprising:
depositing a top epitaxial layer directly on a top surface of a substrate;
depositing a stack directly on a top surface of the top epitaxial layer, the stack comprising a plurality of channel layers interleaved by a plurality of sacrificial layers;
forming a first fin-shaped structure and a second fin-shaped structure from the stack, the top epitaxial layer, and a portion of the substrate;
depositing a dielectric material over the substrate, the first fin-shaped structure and the second fin-shaped structure;
etching back the dielectric material to form an isolation feature having a first portion disposed between the first fin-shaped structure and the second fin-shaped structure and a second portion not disposed between the first fin-shaped structure and the second fin-shaped structure, a top surface of the first portion being higher than a top surface of the second portion;
recessing source/drain regions of the first fin-shaped structure and the second fin-shaped structure to form a source/drain recess that extends into and terminates in the top epitaxial layer;
conformally depositing a semiconductor layer over the source/drain recess;
etching back the semiconductor layer to expose sidewalls of the source/drain recess and form a diffusion stop layer over a bottom surface of the source/drain recess,
depositing a first epitaxial layer over the diffusion stop layer and sidewalls source/drain recess;
depositing a second epitaxial layer over the first epitaxial layer; and
depositing a third epitaxial layer over the second epitaxial layer,
wherein the substrate comprises silicon,
wherein the top epitaxial layer comprises silicon germanium,
wherein a top surface of the diffusion stop layer is lower than the top surface of the first portion of the isolation feature.
18. The method of claim 17 , wherein a germanium content of the top epitaxial layer is between about 18% and about 25%.
19. The method of claim 17 ,
wherein the top epitaxial layer comprises a first germanium concentration, the diffusion stop layer comprises a second germanium concentration and the first epitaxial layer comprises a third germanium concentration,
wherein the second germanium concentration is greater than the first germanium concentration or the third germanium concentration.
20. The method of claim 17 , further comprising:
before the depositing of the conformally depositing of the semiconductor layer, partially and selectively etching the plurality of sacrificial layers to form inner spacer recesses; and
forming inner spacer features into the inner spacer recesses.