Method of manufacturing a solar cell with integral cover glass, and cell obtained
Method of manufacturing a solar cell, comprising: providing a solar cell ( 100 ) having an active surface ( 105 a ) intended, in use, to be exposed to sunlight; forming, in correspondence of said active surface, a protection against low-energy protons and other radiations harmful to the solar cell. Forming a protection comprises forming a layer of resin ( 110; 210 ) and forming by deposition of material on the resin layer a layer of protective material ( 115; 215 b ) on top of the resin layer.
1. Method of fabrication of a semiconductor space solar cell for uses in the space or at high altitude in atmosphere, comprising:
providing a semiconductor solar cell having an active surface which, in use, is intended to be exposed to sunlight for performing photovoltaic conversion;
forming, in correspondence of said active surface, a protection against low-energy protons harmful to the solar cell,
characterized in that
said forming a protection comprises:
forming an adhesive layer of resin and
forming by means of deposition of material on the adhesive layer of resin a single layer of a non-conductive protective material, transparent in an electromagnetic radiation frequency range in which the solar cell is intended to perform the photovoltaic conversion, over the adhesive layer of resin, wherein said forming by means of deposition of material comprises a process or processes of physical vapour deposition—“PVD”,
wherein said single layer of a non-conductive protective material has a thickness greater than 2 μm.
2. Method according to claim 1 , wherein said adhesive layer of resin is formed directly on the active surface of the solar cell.
3. Method according to claim 1 , further comprising:
forming by means of deposition of material a further layer of protective material interposed between the adhesive layer of resin and the active surface of the solar cell.
4. Method according to claim 3 , wherein said forming by means of deposition of material a further layer of protective material interposed between the adhesive layer of resin and the active surface of the solar cell comprise a process or processes of physical vapour deposition—“PVD”.
5. Method according to claim 3 , wherein said further layer of protective material has a thickness greater than 2 μm.
6. Method according to claim 3 , wherein said further layer of protective material comprise or consist of layers of oxide.
7. Method according to claim 6 , wherein said further layer of protective material comprises or consists of one or more layers of SiO 2 and/or Al 2 O 3 and/or Ta 2 O 5 and/or Nb 2 O 5 and/or Y 2 O 3 and/or TiO 2 and/or Sc 2 O 3 and/or CeO 2 and/or HfO 2 and/or SnO 2 and/or LaTiO 3 and/or other materials transparent in the range of frequencies exploited by the solar cell for performing the photovoltaic conversion, comprising MgF 2 and/or CeF 3 and/or ZnS and/or Si 3 N 4 .
8. Method according to claim 4 , wherein said forming by means of deposition of material a further layer of protective material interposed between the adhesive layer of resin and the active surface of the solar cell comprise one among the processes of: thermal evaporation, electron beam, pulsed-laser deposition—“PLD”, sputtering.
9. Method according to claim 1 , wherein said single layer of protective material comprise or consist of layers of oxide.
10. Method according to claim 9 , wherein said layers of oxide comprise or consist of one or more layers of SiO 2 and/or Al 2 O 3 and/or Ta 2 O 5 and/or Nb 2 O 5 and/or Y 2 O 3 and/or TiO 2 and/or Sc 2 O 3 and/or CeO 2 and/or HfO 2 and/or SnO 2 and/or LaTiO 3 and/or other materials transparent in the range of frequencies exploited by the solar cell for performing the photovoltaic conversion, comprising MgF 2 and/or CeF 3 and/or ZnS and/or Si 3 N 4 .
11. Method according to claim 1 , wherein said phase of forming an adhesive layer of resin comprises a process of deposition.
12. Method according to claim 1 , further comprising:
forming alternated adhesive layers of resin and layers of protective material repeated more times over said single layer of a non-conductive protective material.
13. Method according to claim 12 , wherein said alternated adhesive layers of resin and layers of protective material comprise a topmost layer of protective material, the method further comprising:
forming anti-reflecting layers on the topmost layer of protective material.
14. Method according to claim 1 , further comprising:
forming anti-reflecting layers on the single layer of protective material.
15. Method according to claim 1 , wherein said semiconductor solar cell is a III-V solar cell in compounds of groups III and V of the periodic table of the elements.
16. Method according to claim 15 , wherein said semiconductor solar cell is a solar cell in one among: gallium arsenide (GaAs), Indium and Gallium phosphide (InGaP).
17. Method according to claim 1 , wherein said process or processes of physical vapour deposition—“PVD”—comprises one among: thermal evaporation, electron beam, pulsed-laser deposition—“PLD”, sputtering.