Method of manufacturing conductive pattern, touch sensor, electromagnetic wave shield, antenna, wiring board, conductive heating element, and structure
The present disclosure provides a method of manufacturing a conductive pattern and applications thereof, the method including: a step of preparing a laminate including a transparent substrate, a light shielding pattern that is formed on the transparent substrate, and a negative tone photosensitive resin layer that is disposed on the transparent substrate and the light shielding pattern and is in contact with the transparent substrate; a step of irradiating a surface of the transparent substrate opposite to a surface facing the light shielding pattern with light; a step of developing the negative tone photosensitive resin layer to form a resin pattern in a region defined by the transparent substrate and the light shielding pattern; and a step of forming a conductive pattern on the light shielding pattern.
1. A method of manufacturing a conductive pattern, the method comprising:
preparing a laminate including a transparent substrate, a light shielding pattern that is formed on the transparent substrate, and a negative tone photosensitive resin layer that is disposed on the transparent substrate and the light shielding pattern and is in contact with the transparent substrate;
irradiating a surface of the transparent substrate opposite to a surface facing the light shielding pattern with light;
developing the negative tone photosensitive resin layer to form a resin pattern having an average thickness of 10 μm or more in a region defined by the transparent substrate and the light shielding pattern; and
forming a conductive pattern on the light shielding pattern, wherein:
the preparing the laminate includes forming the negative tone photosensitive resin layer on the transparent substrate and the light shielding pattern, in a laminate precursor including the transparent substrate and the light shielding pattern that is formed on the transparent substrate, using a photosensitive transfer material including the negative tone photosensitive resin layer and a temporary support having an average thickness of 5 μm to 50 μm;
the negative tone photosensitive resin layer includes an alkali-soluble polymer, a compound having an ethylenically unsaturated bond, a photopolymerization initiator, a sensitizer, and a chain transfer agent;
the compound having an ethylenically unsaturated bond includes a bifunctional ethylenically unsaturated compound having a bisphenol A structure; and
the photopolymerization initiator includes at least one selected from the group consisting of 2,4,5-triarylimidazole dimer and a derivative of 2,4,5-triarylimidazole dimer.
2. The method of manufacturing a conductive pattern according to claim 1 ,
wherein in forming the conductive pattern, the conductive pattern is formed by plating.
3. The method of manufacturing a conductive pattern according to claim 1 ,
wherein the light shielding pattern is conductive.
4. The method of manufacturing a conductive pattern according to claim 1 ,
wherein an average thickness of the light shielding pattern is 2 μm or less.
5. The method of manufacturing a conductive pattern according to claim 1 , further comprising:
removing the resin pattern after forming the conductive pattern.
6. The method of manufacturing a conductive pattern according to claim 1 ,
wherein the average thickness of the resin pattern is more than an average thickness of the light shielding pattern.
7. The method of manufacturing a conductive pattern according to claim 1 ,
wherein an average width of the light shielding pattern is 5 μm or less.
8. The method of manufacturing a conductive pattern according to claim 1 ,
wherein the light has a wavelength of 365 nm.
9. The method of manufacturing a conductive pattern according to claim 1 ,
wherein the alkali-soluble polymer is a random copolymer.