IP Library Granted Patent US 12,435,164
Granted Patent B2
US 12,435,164 · App. 17/917,101 · Granted Oct 7, 2025

Photocurable composition, coating layer comprising cured product thereof, and substrate for semiconductor process

Inventors: Sang Hwan Kim (Daejeon, KR); Jung Woo Choi (Daejeon, KR); Ki Seung Seo (Daejeon, KR); Kwang Su Seo (Daejeon, KR); Jun Beom Park (Daejeon, KR); Won Seup Cho (Daejeon, KR)
Assignee: LG CHEM, LTD.
C08F2/50C08F220/1808C08F220/1811C08F220/20C08F220/301C08F222/1065C08G18/10C08G18/246C08G18/44C08G18/6229C08J7/042C08J7/046H01L21/6836C08G2150/00C08J2375/14
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,435,164
App. No.
17/917,101
Granted
Oct 7, 2025
Kind
B2
Abstract

The present disclosure provides a photocurable composition, which has excellent coatability and is capable of providing a coating layer having excellent surface quality and thickness uniformity, a coating layer including a cured product of the photocurable composition, and a substrate for a semiconductor process including the coating layer.

Claims (29)

1. A photocurable composition comprising:

a urethane (meth)acrylate-based resin syrup comprising a urethane (meth)acrylate-based resin, which is a reaction product of a polyalkylene carbonate-based urethane prepolymer having an isocyanate end group and a reactive group-containing (meth)acrylate-based compound, and a (meth)acrylate-based monomer mixture;

a polyfunctional urethane (meth)acrylate-based compound; and

a polyfunctional (meth)acrylate-based compound,

wherein the urethane (meth)acrylate-based resin comprises a carbonate repeating unit containing a C 1-10 alkylene having at least one C 1-3 side chain attached thereto, and

wherein the polyfunctional urethane (meth)acrylate-based compound comprises a compound represented by the following Formula 1:

wherein

R 1 , R 2 , and R 3 are each independently a C 2-10 alkylene,

R 4 , R 5 , and R 6 are each independently a C 2-7 alkylene,

R 7 , R 8 , and R 9 are each independently hydrogen or a methyl group, and

n, j and k are each independently an integer ranging from 1 to 3.

2. The photocurable composition of claim 1 , wherein the urethane (meth)acrylate-based resin has a weight-average molecular weight of 20,000 g/mol to 50,000 g/mol.

3. The photocurable composition of claim 1 , wherein the urethane (meth)acrylate-based resin syrup has a viscosity of 400 cP to 3,300 cP.

4. The photocurable composition of claim 1 , wherein the polyalkylene carbonate-based urethane prepolymer is a reaction product of a polyalkylene carbonate-based polyol and a diisocyanate-based compound.

5. The photocurable composition of claim 4 , wherein a content of the diisocyanate-based compound is 10 parts by weight to 20 parts by weight based on 100 parts by weight of the polyalkylene carbonate-based polyol.

6. The photocurable composition of claim 1 , wherein a content of the reactive group-containing (meth)acrylate-based compound is 1 part by weight to 10 parts by weight based on 100 parts by weight of the polyalkylene carbonate-based urethane prepolymer.

7. The photocurable composition of claim 1 , wherein a content of the urethane (meth)acrylate-based resin is 15 parts by weight to 35 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin syrup.

8. The photocurable composition of claim 1 , wherein the (meth)acrylate-based monomer mixture comprises at least one type of monomer selected from an alkyl group-containing (meth)acrylate-based monomer, an alicyclic alkyl group-containing (meth)acrylate-based monomer, an aromatic group-containing (meth)acrylate-based monomer, and a polar functional group-containing (meth)acrylate-based monomer.

9. The photocurable composition of claim 1 , wherein a content of the (meth)acrylate-based monomer mixture is 65 parts by weight to 85 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin syrup.

10. The photocurable composition of claim 1 , wherein a content of the polyfunctional urethane (meth)acrylate-based compound is 2.5 parts by weight to 7.5 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin.

11. The photocurable composition of claim 1 , wherein a content of the polyfunctional (meth)acrylate-based compound is 1 part by weight to 5 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin.

12. The photocurable composition of claim 1 , further comprising a photoinitiator,

wherein a content of the photoinitiator is 0.5 parts by weight to 3 parts by weight based on 100 parts by weight of the urethane (meth)acrylate-based resin.

13. The photocurable composition of claim 1 , having a viscosity of 3,000 cP or less.

14. A coating layer comprising a cured product of the photocurable composition according to claim 1 .

15. The coating layer of claim 14 , having a total thickness variation of 3 μm or less, wherein the total thickness variation is defined as a difference between a maximum thickness and a minimum thickness.

16. A substrate for a semiconductor process comprising:

a substrate film; and

the coating layer according to claim 14 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 9, 2023
From: KIM, SANG HWAN; CHOI, JUNG WOO; SEO, KI SEUNG; PARK, JUN BEOM; CHO, WON SEUP; SEO, KWANG SU
To: LG CHEM, LTD.
Reel/Frame 062933/0897 →
Priority Claims (1)
KR 10-2020-0091287 · Jul 22, 2020 · national
Continuity (1)
Related Publication 20230151123A1 · May 18, 2023
References Cited (34)
US 10717907B2 · Wang et al. · 2020 [cited by applicant]
US 11339288B2 · Kim et al. · 2022 [cited by applicant]
US 20080226916A1 · Steeman et al. · 2008 [cited by applicant]
US 20130265522A1 · Jung et al. · 2013 [cited by applicant]
US 20200157258A1 · Saitoh et al. · 2020 [cited by applicant]
US 20200339809A1 · Kim et al. · 2020 [cited by applicant]
JP 2002501556A · 2002 [cited by applicant]
JP 2006152289A · 2006 [cited by applicant]
JP 2008192217A · 2008 [cited by applicant]
JP 4380396B2 · 2009 [cited by applicant]
JP 2010043194A · 2010 [cited by applicant]
JP 2010287718A · 2010 [cited by applicant]
JP 2011231142A · 2011 [cited by applicant]
JP 2014132075A · 2014 [cited by applicant]
JP 2015147700A · 2015 [cited by applicant]
JP 2016107409A · 2016 [cited by applicant]
JP 2017128634A · 2017 [cited by examiner]
JP 6568383B2 · 2019 [cited by applicant]
JP 6647107B2 · 2020 [cited by applicant]
JP 2020083949A · 2020 [cited by examiner]
KR 1020080008062A · 2008 [cited by applicant]
KR 1020130073353A · 2013 [cited by applicant]
KR 101546937B1 · 2015 [cited by applicant]
KR 1020160057617A · 2016 [cited by applicant]
KR 102036100B1 · 2019 [cited by applicant]
KR 102049589B1 · 2019 [cited by applicant]
TW 201627456A · 2016 [cited by applicant]
TW 201922830A · 2019 [cited by applicant]
WO 2013012031A1 · 2013 [cited by applicant]
WO 2019093731A1 · 2019 [cited by applicant]
Matsushiro et al, JP 2017128634 Machine Translation, Jul. 27, 2017 (Year: 2017). [cited by examiner]
Saito et al, JP 2020083949 Machine Translation, Jun. 4, 2020 (Year: 2020). [cited by examiner]
Extended European Search Report from EPO in Application No. 21845223.3 dated Oct. 25, 2023, 6 pages. [cited by applicant]
International Search Report issued for International Application No. PCT/KR2021/009486, Nov. 10, 2021, 4 pages. [cited by applicant]