IP Library Granted Patent US 12,466,916
Granted Patent B2
US 12,466,916 · App. 16/972,480 · Granted Nov 11, 2025

Polyamide resin, and polymer film, resin laminate using the same

Inventor: Il Hwan Choi (Daejeon, KR)
Assignee: LG CHEM, LTD.
C08G69/32C08G69/265C08G69/28C08G69/42C08G81/00C08J5/18C08J7/046C08L77/10C08J2377/10C08L2201/08C08L2201/10C08L2203/16C08L2203/20C08L2203/30
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Quick Facts
Patent No.
US 12,466,916
App. No.
16/972,480
Granted
Nov 11, 2025
Kind
B2
Abstract

The present invention relates to a polyamide resin in which an average particle size of individual crystals measured by a small-angle X-ray scattering apparatus is 8.0 nm or less, and a polymer film and resin laminate using the same.

Claims (44)

1 . A polyamide resin in which an average particle size of individual crystals measured by a small-angle X-ray scattering apparatus is 8.0 nm or less, wherein the polyamide resin has a haze value measured for a polyamide resin specimen having a thickness of 45 μm or more and 55 μm or less according to ASTM D1003 of 3.0% or less,

wherein amorphous polymer chains are present between the individual crystals having the average particle size of 8.0 nm or less,

wherein a first polyamide segment is included in the individual crystals having the average particle size of 8.0 nm or less,

wherein a second polyamide segment is included in the amorphous polymer chains present between the individual crystals having the average particle size of 8.0 nm or less, and

wherein the first polyamide segment and the second polyamide segment form a main chain including an alternating-repeating unit represented by the following Chemical Formula 4:

in the Chemical Formula 4,

Ar 1 and Ar 2 are each independently a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms,

a1 and a2 are each independently an integer of 1 to 10, and

b1 and b2 are each independently an integer of 1 to 5.

2 . The polyamide resin according to claim 1 , wherein

the average particle size of the individual crystals is measured through an analytical equipment by fitting a scattering pattern obtained by irradiating X-rays with energies of 10 KeV to 20 KeV in the small-angle X-ray scattering apparatus to a solid sphere model.

3 . The polyamide resin according to claim 1 , wherein

a distance between the individual crystals having the average particle size of 8.0 nm or less is 0.1 nm to 100 nm.

4 . The polyamide resin according to claim 1 , wherein

the individual crystals having the average particle size of 8.0 nm or less comprises a first aromatic polyamide repeating unit derived from a combination of a 1,4-aromatic diacyl compound and an aromatic diamine compound.

5 . The polyamide resin according to claim 1 , wherein

the amorphous polymer chain comprises a second aromatic amide repeating unit derived from a combination of a 1,2-aromatic diacyl compound and an aromatic diamine compound, or a third aromatic amide repeating unit derived from a combination of a 1,3-aromatic diacyl compound and an aromatic diamine compound.

6 . The polyamide resin according to claim 1 , wherein

the individual crystals having the average particle size of 8.0 nm or less comprises a first polyamide segment including a repeating unit represented by the following Chemical Formula 1, or a block comprised thereof:

in the Chemical Formula 1, Aris a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms.

7 . The polyamide resin according to claim 6 , wherein

the first polyamide segment has a number average molecular weight of 100 g/mol to 5000 g/mol.

8 . The polyamide resin according to claim 6 , wherein

the polyamide resin includes 40 mol % to 95 mol % of the first polyamide segment based on the total repeating units contained in the polyamide resin.

9 . The polyamide resin according to claim 1 , wherein

a degree of crystallinity measured by the small-angle X-ray scattering apparatus is 20% or less.

10 . The polyamide resin according to claim 6 , wherein

amorphous polymer chains present between the individual crystals having the average particle size of 8.0 nm or less including the first polyamide segment including the repeating unit represented by Chemical Formula 1 or the block composed thereof comprise a second polyamide segment including a repeating unit represented by the following Chemical formula 2, or a block composed thereof:

in the Chemical Formula 2,

Ar 2 is a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms.

11 . The polyamide resin according to claim 1 , wherein

the polyamide resin has a weight average molecular weight of at least 330000 g/mol.

12 . The polyamide resin according to claim 10 , wherein

a content of the repeating units represented by Chemical Formula 2 is 5 mol % to 60 mol % based on the total repeating units contained in the polyamide resin.

13 . The polyamide resin according to claim 10 , wherein

based on the total repeating units contained in the polyamide resin, a content of the repeating units represented by Chemical Formula 1 is 60 mol % to 95 mol %, and the content of the repeating units represented by Chemical Formula 2 is 5 mol % to 40 mol %.

14 . The polyamide resin according to claim 10 , wherein

the repeating unit represented by Chemical Formula 2 comprises a repeating unit represented by the following Chemical Formula 2-1; or a repeating unit represented by Chemical Formula 2-2:

in the Chemical Formulae 2-1 to 2-2,

Ar 2 is a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, or a substituted or unsubstituted heteroarylene group having 2 to 20 carbon atoms.

15 . A polymer film comprising the polyamide resin according to claim 1 .

16 . A resin laminate comprising:

a substrate including a polyamide resin according to claim 1 having an average particle size of individual crystals measured by a small-angle X-ray scattering apparatus is 8.0 nm or less; and

a hard coating layer formed on at least one side of the substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 7, 2020
From: CHOI, IL HWAN
To: LG CHEM, LTD.
Reel/Frame 054563/0867 →
Priority Claims (7)
KR 10-2018-0134755 · Nov 5, 2018 · national
KR 10-2018-0153911 · Dec 3, 2018 · national
KR 10-2019-0014022 · Feb 1, 2019 · national
KR 10-2019-0034611 · Mar 26, 2019 · national
KR 10-2019-0125890 · Oct 11, 2019 · national
KR 10-2019-0137544 · Oct 31, 2019 · national
KR 10-2019-0137545 · Oct 31, 2019 · national
Continuity (1)
Related Publication 20220025117A1 · Jan 27, 2022
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