IP Library Granted Patent US 12,469,689
Granted Patent B2
US 12,469,689 · App. 18/037,383 · Granted Nov 11, 2025

Sample support body, ionization method, and mass spectrometry method

Inventors: Masahiro Kotani (Hamamatsu, JP); Takayuki Ohmura (Hamamatsu, JP); Akira Tashiro (Hamamatsu, JP)
Assignee: HAMAMATSU PHOTONICS K.K.
H01J49/0409
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Quick Facts
Patent No.
US 12,469,689
App. No.
18/037,383
Granted
Nov 11, 2025
Kind
B2
Abstract

A sample support body is used for ionizing a component of a sample. The sample support body includes: a substrate; a porous layer provided on the substrate and having a front surface on a side opposite to the substrate; and a partition portion partitioning the front surface into a first region and a second region. The porous layer includes a main body layer having a plurality of holes opening to the front surface. The partition portion includes a partition groove formed on the front surface so as to pass between the first region and the second region.

Claims (37)

1 . A sample support body used for ionizing a component of a sample, the sample support body comprising:

a substrate;

a porous layer provided on the substrate and having a front surface on a side opposite to the substrate; and

a partition portion partitioning the front surface into a first region and a second region, wherein

the porous layer includes a main body layer having a plurality of holes opening to the front surface, and

the partition portion includes a partition groove formed on the front surface so as to pass between the first region and the second region.

2 . The sample support body according to claim 1 , wherein a width of the partition groove is greater than a depth of the partition groove.

3 . The sample support body according to claim 2 , wherein

the depth of the partition groove is 50 μm or more and 300 μm or less, and

the width of the partition groove is at least twice the depth of the partition groove.

4 . The sample support body according to claim 1 , wherein the partition portion includes, as the partition groove, a part of an annular first partition groove surrounding the first region, a part of an annular second partition groove surrounding the second region, and a part of a third partition groove passing between the first partition groove and the second partition groove.

5 . The sample support body according to claim 1 , wherein

the partition groove extends annularly,

the first region is a region outside the partition groove, and

the second region is a region inside the partition groove.

6 . The sample support body according to claim 1 , further comprising a display portion where predetermined information is displayed,

wherein the display portion includes a display groove formed on the front surface.

7 . The sample support body according to claim 1 , wherein

the main body layer is an insulating layer, and

the porous layer further includes a conductive layer formed along at least the front surface.

8 . The sample support body according to claim 7 , wherein the substrate and the main body layer are formed by anodizing a surface layer of a metal substrate or a silicon substrate.

9 . An ionization method comprising:

a step of preparing the sample support body according to claim 7 ;

a step of disposing the sample to the front surface; and

a step of ionizing the component by irradiating the front surface with an energy ray.

10 . A mass spectrometry method comprising:

the plurality of steps of the ionization method according to claim 9 ; and

a step of detecting the ionized component.

11 . The sample support body according to claim 1 , wherein

the main body layer is an insulating layer, and

the main body layer is exposed to an outside on at least the front surface.

12 . An ionization method comprising:

a step of preparing the sample support body according to claim 11 ;

a step of disposing the sample to the front surface; and

a step of ionizing the component by irradiating the front surface with a charged droplet.

13 . The sample support body according to claim 11 , wherein the substrate and the main body layer are formed by anodizing a surface layer of a metal substrate or a silicon substrate.

14 . The sample support body according to claim 1 , wherein the partition groove is formed on the front surface by the porous layer falling into a groove formed on a front surface of the substrate on the porous layer side.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 17, 2023
From: KOTANI, MASAHIRO; OHMURA, TAKAYUKI; TASHIRO, AKIRA
To: HAMAMATSU PHOTONICS K.K.
Reel/Frame 063669/0549 →
Priority Claims (1)
JP 2020-207048 · Dec 14, 2020 · national
Continuity (1)
Related Publication 20230420237A1 · Dec 28, 2023
References Cited (13)
US 11892429B2 · Hutter · 2024 [cited by examiner]
US 11913861B2 · Musselman · 2024 [cited by examiner]
US 20230411133A1 · Kotani · 2023 [cited by examiner]
CN 1500140A · 2004 [cited by applicant]
CN 100437114C · 2008 [cited by applicant]
CN 110168369A · 2019 [cited by applicant]
EP 3686590A1 · 2020 [cited by applicant]
JP 2020136136A · 2020 [cited by applicant]
WO 02077152A1 · 2002 [cited by applicant]
WO 2020202729A1 · 2020 [cited by applicant]
International Preliminary Report on Patentability mailed Jun. 29, 2023 for PCT/JP2021/034404. [cited by applicant]
“REDIchip™ Resonance-Enhanced Desorption Ionization, https://www.cosmobio.co.jp/product/uploads/document/PTB_REDIchip-Presentation.pdf”, Protea Biosciences, Inc. , Oct. 13, 2020. [cited by applicant]
“Matrix-free Small Molecule Analyses Using REDIchip™ on a MALDI Platform, https://www.cosmobio.co.jp/product/uploads/document/PTB_REDIchip_reference_data_1.pdf”, Protea Biosciences Inc., 2015. [cited by applicant]