Microwave treatment of replicated optical structures
An example method includes pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, in which a plurality of nano-sized microwave susceptors are embedded in the replication material, curing the replication material by applying microwaves to the replication material, and removing the face of the stamp from contact with the replication material.
1 . A method comprising:
pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nano-sized microwave susceptors are embedded in the replication material, and wherein the plurality of nano-sized microwave susceptors comprise silicon carbide (SiC);
curing the replication material by applying microwaves to the replication material; and
removing the face of the stamp from contact with the replication material.
2 . The method of claim 1 , wherein a plurality of optical nanoparticles are embedded in the replication material, the plurality of optical nanoparticles composed of a material different from the SiC of the plurality of nano-sized microwave susceptors.
3 . The method of claim 2 , wherein the plurality of nano-sized microwave susceptors have a smaller size than the plurality of optical nanoparticles.
4 . The method of claim 2 , wherein the plurality of optical nanoparticles have a higher refractive index than the plurality of nano-sized microwave susceptors.
5 . The method of claim 2 , wherein the plurality of optical nanoparticles are composed of a transition metal oxide, a chalcogenide, or an antimonide.
6 . The method of claim 1 , wherein the predetermined characteristic comprises a surface structure of the replication material.
7 . The method of claim 1 , wherein at least one of a portion of the substrate or a portion of the stamp is substantially transparent to microwaves.
8 . The method of claim 1 , wherein the plurality of nano-sized microwave susceptors have a diameter in a range from 10 nm to 100 nm.
9 . The method of claim 1 , wherein the plurality of nano-sized microwave susceptors have a microwave loss tangent in a range from 0.01 to 2.0 at 25° C.
10 . The method of claim 1 , wherein the plurality of nano-sized microwave susceptors have a microwave loss tangent of at least 2.0 at 25° C.
11 . A method comprising:
pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nanoparticles are embedded in the replication material, at least a portion of the plurality of nanoparticles being nano-sized microwave susceptors, wherein the nano-sized microwave susceptors comprise silicon carbide (SiC);
at least partially curing the replication material while the stamp is in contact with the replication material, wherein the at least partially curing the replication material does not include microwave radiation;
after the at least partially curing the replication material, removing the stamp from contact with the replication material; and
after removing the stamp from contact with the replication material, applying microwaves to the plurality of nanoparticles.
12 . The method of claim 11 , wherein the applying microwaves to the plurality of nanoparticles causes removal of at least some of the replication material.
13 . The method of claim 11 , wherein the at least partially curing the replication material comprises applying at least one of non-microwave heating or UV radiation.
14 . The method of claim 11 , wherein the applying microwaves to the plurality of nanoparticles causes the plurality of nanoparticles to sinter.
15 . The method of claim 14 , wherein the sintered plurality of nanoparticles form an optical metastructure.
16 . The method of claim 11 , wherein the predetermined characteristic comprises a surface structure of the replication material.
17 . The method of claim 11 , wherein at least a portion of the substrate is substantially transparent to the microwaves.
18 . The method of claim 11 , wherein the at least partially curing the replication material is limited to a partial cure, and wherein the microwaves are configured to completely cure the replication material.
19 . A method comprising:
pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nano-sized microwave susceptors are embedded in the replication material, and wherein the plurality of nano-sized microwave susceptors comprise silicon carbide (SiC) or yttria-stabilized zirconia (YSZ),
wherein a plurality of optical nanoparticles are embedded in the replication material, the plurality of optical nanoparticles composed of a material different from the SiC or the YSZ of the plurality of nano-sized microwave susceptors, and
wherein the plurality of nano-sized microwave susceptors have a smaller size than the plurality of optical nanoparticles;
curing the replication material by applying microwaves to the replication material; and
removing the face of the stamp from contact with the replication material.
20 . The method of claim 19 , wherein the plurality of optical nanoparticles have a higher refractive index than the plurality of nano-sized microwave susceptors.
21 . The method of claim 19 , wherein the plurality of nano-sized microwave susceptors have a microwave loss tangent in a range from 0.01 to 2.0 at 25° C.