Granted Patent
Utility
US 4,230,505 · App. 06/082,733
Method of making an impatt diode utilizing a combination of epitaxial deposition, ion implantation and substrate removal
Inventors:
Chung P. Wu, Arye Rosen
Patented Case
View Patent ↗
Granted: Oct 28, 1980
Filed: Oct 9, 1979
Inventors
Chung P. Wu
Arye Rosen
Assignee (at issue)
RCA Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.