IP Library › Granted Patent US 4,328,068
Granted Patent Utility
US 4,328,068 · App. 06/171,271

Method for end point detection in a plasma etching process

Inventor: Bernard J. Curtis
Patented Case View Patent ↗
Granted: May 4, 1982 Filed: Jul 22, 1980
Inventor
Bernard J. Curtis
Assignee (at issue)
RCA Corporation

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Quick Facts
Patent No.
US 4,328,068
App. No.
06/171,271
Filed
1980-07-22
Granted
1982-05-04
Kind
A