Granted Patent
Utility
US 4,441,957 · App. 06/210,246
Method for selectively etching integral cathode substrate and support
Inventors:
Wayne R. Poff, Donald W. Bartch
Patented Case
View Patent ↗
Granted: Apr 10, 1984
Filed: Nov 25, 1980
Inventors
Wayne R. Poff
Donald W. Bartch
Assignee (at issue)
RCA Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.