IP Library › Granted Patent US 4,443,931
Granted Patent Utility
US 4,443,931 · App. 06/392,870

Method of fabricating a semiconductor device with a base region having a deep portion

Inventors: Bantval J. Baliga, Michael Adler
Patented Case View Patent ↗
Granted: Apr 24, 1984 Filed: Jun 28, 1982
Inventors
Bantval J. Baliga
Michael Adler
Assignee (at issue)
General Electric Company

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Quick Facts
Patent No.
US 4,443,931
App. No.
06/392,870
Filed
1982-06-28
Granted
1984-04-24
Kind
A