IP Library › Granted Patent US 4,499,652
Granted Patent Utility
US 4,499,652 · App. 06/532,259

Method of forming a MOSFET with both improved breakdown resistance and less hot-electron effects

Inventor: Rituparna Shrivastava
Patented Case View Patent ↗
Granted: Feb 19, 1985 Filed: Sep 15, 1983
Inventor
Rituparna Shrivastava
Assignee (at issue)
Mostek Corporation

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Quick Facts
Patent No.
US 4,499,652
App. No.
06/532,259
Filed
1983-09-15
Granted
1985-02-19
Kind
A