IP Library › Granted Patent US 4,654,509
Granted Patent Utility
US 4,654,509 · App. 06/784,739

Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus

Inventors: McDonald Robinson, Ronald D. Behee, Wiebe B. deBoer, Wayne Johnson
Patented Case View Patent ↗
Granted: Mar 31, 1987 Filed: Oct 7, 1985
Inventors
McDonald Robinson
Ronald D. Behee
Wiebe B. deBoer
Wayne Johnson
Assignee (at issue)
Epsilon Limited Partnership

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Quick Facts
Patent No.
US 4,654,509
App. No.
06/784,739
Filed
1985-10-07
Granted
1987-03-31
Kind
A