Granted Patent
Utility
US 4,725,523 · App. 06/915,897
Positive photosensitive compositions with 1,2-naphthoquinone diazide and novolak resin prepared from .alpha.-naphthol and p-cresol
Inventors:
Konoe Miura, Hideki Nagasaka, Noriaki Takahashi, Tameichi Ochiai, Ryuichiro Takasaki
Patented Case
View Patent ↗
Granted: Feb 16, 1988
Filed: Oct 6, 1986
Inventors
Konoe Miura
Hideki Nagasaka
Noriaki Takahashi
Tameichi Ochiai
Ryuichiro Takasaki
Assignee (at issue)
Mitsubishi Chemical Industries, Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.