IP Library › Granted Patent US 4,804,978
Granted Patent Utility
US 4,804,978 · App. 07/157,755

Exposure control system for full field photolithography using pulsed sources

Inventor: David H. Tracy
Patented Case View Patent ↗
Granted: Feb 14, 1989 Filed: Feb 19, 1988
Inventor
David H. Tracy
Assignee (at issue)
PerkinElmer, Inc.

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Quick Facts
Patent No.
US 4,804,978
App. No.
07/157,755
Filed
1988-02-19
Granted
1989-02-14
Kind
A