Granted Patent
Utility
US 4,845,054 · App. 07/068,727
Low temperature chemical vapor deposition of silicon dioxide films
Inventor:
James Mitchener
Patented Case
View Patent ↗
Granted: Jul 4, 1989
Filed: Jun 29, 1987
Inventor
James Mitchener
Assignee (at issue)
Focus Semiconductor Systems, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.