IP Library › Granted Patent US 4,891,335
Granted Patent Utility
US 4,891,335 · App. 07/251,115

Semiconductor substrate heater and reactor process and apparatus

Inventor: Michael A. McNeilly
Patented Case View Patent ↗
Granted: Jan 2, 1990 Filed: Sep 29, 1988
Inventor
Michael A. McNeilly
Assignee (at issue)
Advantage Production Technology, Inc.

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 4,891,335
App. No.
07/251,115
Filed
1988-09-29
Granted
1990-01-02
Kind
A