Granted Patent
Utility
US 5,122,251 · App. 07/650,788
High density plasma deposition and etching apparatus
Inventors:
Gregor A. Campbell, Robert W. Conn, David C. Pearson, Alexis P. deChambrier, Tatsuo Shoji
Patented Case
View Patent ↗
Granted: Jun 16, 1992
Filed: Feb 4, 1991
Inventors
Gregor A. Campbell
Robert W. Conn
David C. Pearson
Alexis P. deChambrier
Tatsuo Shoji
Assignee (at issue)
Plasma & Materials Technologies, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.