IP Library › Granted Patent US 5,182,234
Granted Patent Utility
US 5,182,234 · App. 07/737,560

Profile tailored trench etch using a SF.sub.6 -O.sub.2 etching composition wherein both isotropic and anisotropic etching is achieved by varying the amount of oxygen

Inventor: Theodore O. Meyer
Patented Case View Patent ↗
Granted: Jan 26, 1993 Filed: Jul 26, 1991
Inventor
Theodore O. Meyer
Assignee (at issue)
Advanced Power Technology Corporation

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Quick Facts
Patent No.
US 5,182,234
App. No.
07/737,560
Filed
1991-07-26
Granted
1993-01-26
Kind
A